Effect of NH3 on the preparation of TiNx films by laser CVD using tetrakis-diethylamido-titanium
- Author
- YANSHENG GONG1 ; RONG TU1 ; GOTO, Takashi1
[1] Institute for Materials Research, Tohoku University, Aoba-ku, 2-1-1 Katahira, Sendai 980-8577, Japan - Source
Journal of alloys and compounds. 2009, Vol 485, Num 1-2, pp 451-455, 5 p ; ref : 23 ref
- ISSN
- 0925-8388
- Scientific domain
- Inorganic chemistry; Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Kidlington
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Author keyword
- LCVD Microstructure Preferred orientation TDEAT TiNx films
- Keyword (fr)
- Ammoniac Couche mince Dépôt chimique phase vapeur Dépôt laser Microstructure Nitrure de titane Orientation préférentielle Paramètre cristallin Photoluminescence Structure cristalline Texture Titane Vitesse dépôt 6166 7855 8115G NH3 Ti
- Keyword (en)
- Ammonia Thin films CVD Laser deposition Microstructure Titanium nitride Preferred orientation Lattice parameters Photoluminescence Crystal structure Texture Titanium Deposition rate
- Keyword (es)
- Titanio nitruro Orientación preferencial Velocidad deposición
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A66 Structure of specific crystalline solids
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H55 Photoluminescence
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22060685
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.jallcom.2009.05.137 
https://dx.doi.org/10.1016/j.jallcom.2009.05.137
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