The Novel Plasma Etching Process for Defect Reduction in Photomask Fabrication
- Author
- LEE, Ji-Hyun1 ; JANG, Il-Yong1 ; YU SUK JEONG1 ; SEUNG, Byounghoon1 ; MOON, Seong-Yong1 ; WOO, Sang-Gyun1 ; HAN KU CHO1
[1] SAMSUNG ELECTRONICS CO., LTD. San#16 Banwol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Korea, Republic of - Conference title
- Photomask and next-generation lithography mask technology XVI (8-10 April 2009, Yokohama, Japan)
- Conference name
- Photomask and next-generation lithography mask technology (16 ; Yokohama 2009)
- Author (monograph)
- Hosono, Kunihiro (Editor)
Photomask Japan, Japan (Organiser of meeting)
BACUS, Technical group (Organiser of meeting)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379 ; 1Vol ; 737906.1-737906.9 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-7656-2 0-8194-7656-0
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Analyse quantitative Carbone Déphasage Détection défaut Figure attaque Fluor Gravure plasma In situ Lithographie Masque déphasage Nettoyage Niveau défaut Photolithographie Plasma Procédé de transfert Reproductibilité Resist Traitement par plasma 0130C 4282C 8437 8540H Masque phase
- Keyword (en)
- Quantitative chemical analysis Carbon Phase shift Defect detection Etch pits Fluorine Plasma etching In situ Lithography Phase shifting masks Cleaning Defect level Photolithography Plasma Transfer processing Reproducibility Resists Plasma assisted processing Phase mask
- Keyword (es)
- Detección imperfección Grabado plasma In situ Procesamiento de transferencia Reproductividad
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22130820
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.824247 
https://dx.doi.org/10.1117/12.824247
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