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Effect of lattice mismatch on gate lag in high quality InAlN/AlN/GaN HFET structures

Author
LEACH, J. H1 ; WU, M1 ; NI, X1 ; LI, X1 ; ÖZGÜR, Ü1 ; MORKOC, H1
[1] Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond VA, 23284, United States
Source

Physica status solidi. A, Applications and materials science (Print). 2010, Vol 207, Num 1, pp 211-216, 6 p ; ref : 28 ref

ISSN
1862-6300
Scientific domain
Crystallography; Electronics; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Wiley-VCH, Berlin
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Accommodation réseau Couche contrainte Discontinuité bande Etat électronique interface Hétérostructure Nitrure d'aluminium Nitrure d'indium Nitrure de gallium Paramètre cristallin Transconductance Transistor effet champ hétérojonction AlN GaN InN Paramètre de courbure
Keyword (en)
Mismatch lattice Strained layer Band offset Interface electron state Heterostructures Aluminium nitride Indium nitride Gallium nitride Lattice parameters Transconductance Heterojunction field effect transistor Bowing parameter
Keyword (es)
Acomodación red Capa forzada Discontinuidad banda Estado electrónico interfase Aluminio nitruro Indio nitruro Galio nitruro Parámetro cristalino Transconductancia Transistor efecto campo heterounión
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F04 Transistors

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22346609

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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