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Effect of chamber pressure and hydrogen on the formation of C3N4 films deposited on quartz substrates via MPCVD

Author
WU, Yu-Shiang1 ; WU, Sih-Wei1
[1] Department of Mechanical Engineering, China University of Science and Technology, Taipei 115, Taiwan, Province of China
Source

Journal of alloys and compounds. 2010, Vol 489, Num 1, pp 275-280, 6 p ; ref : 22 ref

ISSN
0925-8388
Scientific domain
Inorganic chemistry; Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
AFM Microstructure Nitride materials Vapor deposition X-ray diffraction
Keyword (fr)
Diffraction RX Dureté Microscopie force atomique Microscopie électronique balayage Microstructure Morphologie surface Méthode PECVD Nanoindentation Nitrure de carbone Procédé dépôt Rugosité Réseau hexagonal Spectrométrie FTIR C3N4
Keyword (en)
XRD Hardness Atomic force microscopy Scanning electron microscopy Microstructure Surface morphology PECVD Nanoindentation Carbon nitrides Deposition process Roughness Hexagonal lattices Fourier-transformed infrared spectrometry
Keyword (es)
Nanoindentacion Procedimiento revestimiento Espectrometría FTIR
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22347366

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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