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Early stages of the chemical vapor deposition of pyrolytic carbon investigated by atomic force microscopy

Author
PFRANG, Andreas1 ; WAN, Yong-Zhong1 ; SCHIMMEL, Thomas1 2
[1] Institute of Applied Physics and Centre for Functional Nanostructures (CFN), University of Karlsruhe, 76128 Karlsruhe, Germany
[2] Institute of Nanotechnology, Forschungszentrum Karlsruhe, 76021 Karlsruhe, Germany
Source

Carbon (New York, NY). 2010, Vol 48, Num 3, pp 921-923, 3 p ; ref : 13 ref

CODEN
CRBNAH
ISSN
0008-6223
Scientific domain
Chemistry; Energy; Chemical industry parachemical industry; Nanotechnologies, nanostructures, nanoobjects; Physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Carbone Dépôt chimique phase vapeur Film Formation image Microscopie force atomique Nucléation Procédé dépôt Silicium Substrat Temps séjour 8105U
Keyword (en)
Carbon CVD Films Imaging Atomic force microscopy Nucleation Deposition process Silicon Substrates Residence time
Keyword (es)
Procedimiento revestimiento Tiempo estancia
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22348147

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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