Early stages of the chemical vapor deposition of pyrolytic carbon investigated by atomic force microscopy
- Author
- PFRANG, Andreas1 ; WAN, Yong-Zhong1 ; SCHIMMEL, Thomas1 2
[1] Institute of Applied Physics and Centre for Functional Nanostructures (CFN), University of Karlsruhe, 76128 Karlsruhe, Germany
[2] Institute of Nanotechnology, Forschungszentrum Karlsruhe, 76021 Karlsruhe, Germany - Source
Carbon (New York, NY). 2010, Vol 48, Num 3, pp 921-923, 3 p ; ref : 13 ref
- CODEN
- CRBNAH
- ISSN
- 0008-6223
- Scientific domain
- Chemistry; Energy; Chemical industry parachemical industry; Nanotechnologies, nanostructures, nanoobjects; Physics
- Publisher
- Elsevier, Kidlington
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Carbone Dépôt chimique phase vapeur Film Formation image Microscopie force atomique Nucléation Procédé dépôt Silicium Substrat Temps séjour 8105U
- Keyword (en)
- Carbon CVD Films Imaging Atomic force microscopy Nucleation Deposition process Silicon Substrates Residence time
- Keyword (es)
- Procedimiento revestimiento Tiempo estancia
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05T Fullerenes and related materials; diamonds, graphite
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22348147
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.carbon.2009.10.031 
https://dx.doi.org/10.1016/j.carbon.2009.10.031
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