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Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures

Author
NAVINSEK, B1 ; PANJAN, P1 ; MILOSEV, I1
[1] J. Stefan Institute, Jamova 39, 1001 Ljubjana, Slovenia
Conference title
PSE-96 International Conference on Plasma Surface Engineering
Conference name
PSE-96 International Conference on Plasma Surface Engineering (5 ; Garmisch-Partenkirchen 1996-09-09)
Author (monograph)
European Joint Committee on Plasma and Ion Surface Engineering (EJC/Europe), Europe (Funder/Sponsor)
Source

Surface & coatings technology. 1997, Vol 97, Num 1-3, pp 182-191 ; ref : 35 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Application industrielle Cathode émission thermoélectronique Chrome nitrure Condition opératoire Couche mince Dépôt physique phase vapeur Effet température Etude expérimentale Outil coupe Pulvérisation irradiation Revêtement dur Revêtement Traitement surface
Keyword (en)
Industrial application Thermionic cathodes Chromium nitrides Operating conditions Thin films Physical vapor deposition Temperature effects Experimental study Cutting tools Sputtering Hard coating Coatings Surface treatments
Keyword (es)
Aplicación industrial Condición operatoria Revestimiento duro
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
8115C Deposition by sputtering

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2241767

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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