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11-Megapixel CMOS-Integrated SiGe Micromirror Arrays for High-End Applications

Author
WITVROUW, Ann1 ; HASPESLAGH, Luc1 ; MAGNEE, Peter H. C4 ; JAN LOUS, Erik5 ; HAGTING, Marco6 ; LAURIA, John7 ; VANNEER, Roel7 ; VAN DRIEENHUIZEN, Bert7 ; VARELA PEDREIRA, Olalla1 ; DE COSTER, Jeroen1 ; DE WOLF, Ingrid1 ; TILMANS, Harrie A. C1 ; BEARDA, Twan1 ; SCHLATMANN, Bart2 ; VAN BOMMEL, Mark2 ; DE NOOIJER, Marie-Christine3
[1] IMEC, 3001 Leuven, Belgium
[2] Philips Applied Technologies, 5656 AE Eindhoven, Netherlands
[3] Holst Centre, IMEC, 5656 AE Eindhoven, Netherlands
[4] NXP Semiconductors, 6534 AE Nijmegen, Netherlands
[5] Bruco B.V., 7623 CS Borne, Netherlands
[6] ASML, Wilton, CT 06897, United States
[7] ASML, 5504 DR Veldhoven, Netherlands
Source

Journal of microelectromechanical systems. 2010, Vol 19, Num 1, pp 202-214, 13 p ; ref : 21 ref

ISSN
1057-7157
Scientific domain
Electronics; Mechanics acoustics; Physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Author keyword
CMOS integration SiGe micromirror reliable
Keyword (fr)
Angle inclinaison Antenne miroir Carbure de silicium Dispositif microélectromécanique Découpage Encapsulation Etude expérimentale Interféromètre optique Lithographie sans masque Micromiroir Modulateur optique Modulateur spatial Métal Métrologie surface Nanotechnologie Nettoyage Optique intégrée Pixel Planéité Technologie MOS complémentaire Transport particule
Keyword (en)
Tilt angle Mirror antenna Silicon carbide Microelectromechanical device Cutting Encapsulation Experimental study Light interferometers Maskless lithography Micromirrors Optical modulator Spatial modulator Metal Surface metrology Nanotechnology Cleaning Integrated optics Pixel Flatness Complementary MOS technology Particle transport
Keyword (es)
Angulo inclinación Antena espejo Silicio carburo Dispositivo microelectromecánico Troquelado Encapsulación Estudio experimental Litografía sin máscara Modulador óptico Modulador espacial Metal Metrología superficie Nanotecnología Limpieza Optica integrada Pixel Planeidad Tecnología MOS complementario Transporte partícula
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G10 Mechanical instruments, equipment and techniques / 001B00G10C Micromechanical devices and systems

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides

Discipline
Electronics Metrology
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22420855

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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