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Effect of in vacuo surface pre-treatment on the growth kinetics and chemical constitution of ultra-thin oxide films on Al-Mg alloy substrates

Author
PANDA, E1 ; JEURGENS, L. P. H1 ; MITTEMEIJER, E. J1
[1] Max Planck Institute for Metals Research, Heisenbergstrasse 3, 70569 Stuttgart, Germany
Source

Surface science. 2010, Vol 604, Num 5-6, pp 588-595, 8 p ; ref : 36 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
AR-XPS AlMg alloys In situ spectroscopic ellipsometry Oxidation Surface pre-treatment Ultra-thin oxide film
Keyword (fr)
Cinétique Couche ultramince Ellipsométrie In situ Oxydation Spectre photoélectron RX Traitement surface
Keyword (en)
Kinetics Ultrathin films Ellipsometry In situ Oxidation X-ray photoelectron spectra Surface treatments
Keyword (es)
In situ
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22520199

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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