Investigations of Chemical Modifications of Amino-Terminated Organic Films on Silicon Substrates and Controlled Protein Immobilization
- Author
- KIM, Joonyeong1 ; CHO, Joungmo2 ; SEIDLER, Paul M1 ; KURLAND, Nicholas E3 ; YADAVALLI, Vamsi K3
[1] Department of Chemistry, Buffalo State, State University of New York, 1300 Elmwood Avenue, Buffalo, New York 14222, United States
[2] Department of Chemical Engineering, Coessmann Laboratory, 686 North Pleasant Street, University of Massachusetts, Amherst, Massachusetts 01003, United States
[3] Department of Chemical and Life Science Engineering, Virginia Commonwealth University, 601 West Main Street, Richmond, Virginia 23284-3028, United States - Source
Langmuir. 2010, Vol 26, Num 4, pp 2599-2608, 10 p
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Activité biologique Aldéhyde Amine primaire Antigène Couche mince Ellipsométrie Epaisseur Ester Film Fluorescence Fluorescéine Fragment Glucide Groupe aminé Groupe fonctionnel IgG Immobilisation Immunoglobuline Microscopie fluorescence Microscopie force atomique Modification chimique Pastille électronique Protéine Réflexion totale Résidu Silicium Spectrométrie IR Stabilité Substrat Toluène
- Keyword (en)
- Biological activity Aldehyde Primary amine Antigen Thin film Ellipsometry Thickness Ester Film Fluorescence Fluorescein Fragment Carbohydrate Amino group Functional group IgG Immobilization Immunoglobulins Fluorescence microscopy Atomic force microscopy Chemical modification Wafer Protein Total reflection Residue Silicon Infrared spectrometry Stability Substrate Toluene
- Keyword (es)
- Actividad biológica Aldehído Amina primaria Antígeno Capa fina Elipsometría Espesor Ester Película Fluorescencia Fluoresceína Fragmento Glúcido Grupo aminado Grupo funcional IgG Inmovilización Inmunoglobulina Microscopía fluorescencia Microscopía fuerza atómica Modificación química Pastilla electrónica Proteína Reflexión total Resíduo Silicio Espectrometría IR Estabilidad Substrato Tolueno
- Classification
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01I Surface physical chemistry
- Pascal
- 001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state
- Discipline
- General chemistry and physical chemistry
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22535879
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1021/la904027p 
https://dx.doi.org/10.1021/la904027p
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