Molecular dynamics simulations of the sputtering of SiC and Si3N4
- Author
- PRSKALO, A.-P1 ; SCHMAUDER, S1 ; ZIEBERT, C2 ; YE, J2 ; ULRICH, S2
[1] Institute for Materials Testing, Materials Science and Strength of Materials (IMWF), University of Stuttgart, Pfaffenwaldring 32, 70569 Stuttgart, Germany
[2] Institute for Materials Research I, Forschungszentrum Karlsruhe, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany - Conference title
- Protective Coatings and Thin Films-09
- Conference name
- Eeuropean Materials Research Society (E-MRS) Spring Meeting 2009. Symposium P Protective Coatings and Thin Films-09 (E-MRS) Spring Meeting 2009. Symposium P Protective Coatings and Thin Films-09 (Strasbourg 2009-06-08)
- Author (monograph)
- European Material Research Society (E-MRS), Strasbourg, France (Organiser of meeting)
- Source
Surface & coatings technology. 2010, Vol 204, Num 12-13, pp 2081-2084, 4 p ; ref : 21 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Magnetron sputtering Molecular dynamics simulation Silicon carbide Silicon nitride Sputter yield
- Keyword (fr)
- Carbure de silicium Dynamique moléculaire Dépôt physique phase vapeur Magnétron Nitrure de silicium Pulvérisation irradiation Simulation Traitement surface
- Keyword (en)
- Silicon carbide Molecular dynamics Physical vapor deposition Magnetrons Silicon nitride Sputtering Simulation Surface treatments
- Keyword (es)
- Silicio carburo Dinámica molecular Silicio nitruro
- Keyword (de)
- Siliciumcarbid Molekulardynamik Siliciumnitrid
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22540735
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.surfcoat.2009.09.043 
https://dx.doi.org/10.1016/j.surfcoat.2009.09.043
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:3:\"204\";s:8:\"\u0000*\u0000issue\";s:5:\"12-13\";s:8:\"\u0000*\u0000spage\";s:4:\"2081\";s:8:\"\u0000*\u0000epage\";s:4:\"2084\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PRSKALO\";s:10:\"\u0000*\u0000aufirst\";s:4:\"A.-P\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:12:\"SCHMAUDER, S\";i:1;s:10:\"ZIEBERT, C\";i:2;s:5:\"YE, J\";i:3;s:9:\"ULRICH, S\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:37:\"Protective Coatings and Thin Films-09\";s:8:\"\u0000*\u0000title\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:3:\"204\";s:8:\"\u0000*\u0000issue\";s:5:\"12-13\";s:8:\"\u0000*\u0000spage\";s:4:\"2081\";s:8:\"\u0000*\u0000epage\";s:4:\"2084\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PRSKALO\";s:10:\"\u0000*\u0000aufirst\";s:4:\"A.-P\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:12:\"SCHMAUDER, S\";i:1;s:10:\"ZIEBERT, C\";i:2;s:5:\"YE, J\";i:3;s:9:\"ULRICH, S\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:37:\"Protective Coatings and Thin Films-09\";s:8:\"\u0000*\u0000title\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:3:\"204\";s:8:\"\u0000*\u0000issue\";s:5:\"12-13\";s:8:\"\u0000*\u0000spage\";s:4:\"2081\";s:8:\"\u0000*\u0000epage\";s:4:\"2084\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PRSKALO\";s:10:\"\u0000*\u0000aufirst\";s:4:\"A.-P\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:12:\"SCHMAUDER, S\";i:1;s:10:\"ZIEBERT, C\";i:2;s:5:\"YE, J\";i:3;s:9:\"ULRICH, S\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:37:\"Protective Coatings and Thin Films-09\";s:8:\"\u0000*\u0000title\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:3:\"204\";s:8:\"\u0000*\u0000issue\";s:5:\"12-13\";s:8:\"\u0000*\u0000spage\";s:4:\"2081\";s:8:\"\u0000*\u0000epage\";s:4:\"2084\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PRSKALO\";s:10:\"\u0000*\u0000aufirst\";s:4:\"A.-P\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:12:\"SCHMAUDER, S\";i:1;s:10:\"ZIEBERT, C\";i:2;s:5:\"YE, J\";i:3;s:9:\"ULRICH, S\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:37:\"Protective Coatings and Thin Films-09\";s:8:\"\u0000*\u0000title\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:30:\"10.1016\/j.surfcoat.2009.09.043\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Surface & coatings technology\";s:9:\"\u0000*\u0000stitle\";s:19:\"Surf. coat. technol\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:3:\"204\";s:8:\"\u0000*\u0000issue\";s:5:\"12-13\";s:8:\"\u0000*\u0000spage\";s:4:\"2081\";s:8:\"\u0000*\u0000epage\";s:4:\"2084\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0257-8972\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PRSKALO\";s:10:\"\u0000*\u0000aufirst\";s:4:\"A.-P\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:12:\"SCHMAUDER, S\";i:1;s:10:\"ZIEBERT, C\";i:2;s:5:\"YE, J\";i:3;s:9:\"ULRICH, S\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"SCTEEJ\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:37:\"Protective Coatings and Thin Films-09\";s:8:\"\u0000*\u0000title\";s:65:\"Molecular dynamics simulations of the sputtering of SiC and Si3N4\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"4\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
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