Influence of FIB patterning strategies on the shape of 3D structures: Comparison of experiments with simulations
- Author
- ROMMEL, M1 ; JAMBRECK, J. D1 ; EBM, C2 ; PLATZGUMMER, E2 ; BAUER, A. J1 ; FREY, L1 3
[1] Fraunhofer Institute for Integrated Systems and Device Technology (IISB), Schottkystrasse 10, 91058 Erlangen, Germany
[2] IMS Nanofabrication AG, Schreygasse 3, 1020 Vienna, Austria
[3] Electron Devices, Friedrich-Alexander-University of Erlangen-Nuremberg, Cauerstrasse 6, 91058 Erlangen, Germany - Conference title
- The 35th International Conference on Micro- and Nano-Engineering (MNE), 28 September-1 October, 2009, Ghent, Belgium
- Conference name
- International Conference on Micro- and Nano-Engineering (MNE) (MNE) (35 ; Ghent 2009-09-28)
- Author (monograph)
- RONSE, Kurt (Editor); VAN THOURHOUT, Dries (Editor); DE GENDT, Stefan (Editor); LAGAE, Liesbet (Editor); VANDENBERGHE, Geert (Editor); WITVROUW, Ann (Editor)
- Source
Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 1566-1568, 3 p ; ref : 7 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- FIB patterning FIB Focused ion beam Patterning simulation Patterning strategy
- Keyword (fr)
- Dépôt pulvérisation Etude comparative Fabrication microélectronique Faisceau ion Faisceau ionique Formation motif Matériau pulvérisé Technologie faisceau ion focalisé Traitement matériau 8116R 8540H
- Keyword (en)
- Sputter deposition Comparative study Microelectronic fabrication Ion beams Ion beam Patterning Sputtered materials Focused ion beam technology Material processing
- Keyword (es)
- Estudio comparativo Fabricación microeléctrica Haz iónico Tratamiento material
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16R Nanoscale pattern formation
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22628879
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2009.10.054 
https://dx.doi.org/10.1016/j.mee.2009.10.054
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