Monte Carlo simulations of electron beam - solid interactions as an aid in interpretation of EDS and Auger analysis of particles and defects
- Author
- KINGSLEY, J. R1 ; HARRIS, D. W1
[1] Charles Evans and Associates, Redwood City, CA 94086, United States - Conference title
- Metrology, inspection, and process control for microlithography XII (Santa Clara CA, 23-25 February 1998)
- Conference name
- Metrology, inspection, and process control for microlithography. Conference (12 ; Santa Clara CA 1998-02-23)
- Author (monograph)
- Bhanwar Singh (Editor)
International Society for Optical Engineering, Bellingham WA, United States (Organiser of meeting)
Semiconductor Equipment and Materials International (Organiser of meeting)
SEMATECH (Organiser of meeting) - Source
SPIE proceedings series. 1998, pp 501-507 ; ref : 5 ref
- ISBN
- 0-8194-2777-2
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics; Telecommunications
- Publisher
- SPIE, Bellingham WA
- Publication country
- International
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Détection défaut Microscopie Auger Méthode Monte Carlo Simulation Spectrométrie RX
- Keyword (en)
- Defect detection Auger microscopy Monte Carlo methods Simulation X-ray spectroscopy
- Keyword (es)
- Detección imperfección Microscopía Auger
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G85 X- and γ-ray instruments and techniques / 001B00G85N X- and γ-ray spectrometers
- Discipline
- Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2290715
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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