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Monocrystalline zinc oxide films grown by atomic layer deposition

Author
WACHNICKI, L1 ; KRAJEWSKI, T1 ; LUKA, G1 ; WITKOWSKI, B3 ; KOWALSKI, B1 ; KOPALKO, K1 ; DOMAGALA, J. Z1 ; GUZIEWICZ, M2 ; GODLEWSKI, M1 3 ; GUZIEWICZ, E1
[1] Polish Academy of Sciences, Institute of Physics, al. Lomik6w 32/46, Warszawa 02-668, Poland
[2] Institute of Electron Technology (ITE), al. Lotników 32/46, Warsaw 02-668, Poland
[3] Cardinal Stefan Wyszynski University, College of Science, Department of Mathematics and Natural Sciences, Warszawa, Poland
Conference title
Proceedings of the EMRS 2009 Spring Meeting Symposium H: Synthesis, Processing and Characterization of Nanoscale Multi Functional Oxide Films II
Conference name
EMRS 2009 Spring Meeting. Symposium H Synthesis, Processing and Characterization of Nanoscale Multi Functional Oxide Films (Strasbourg 2009-06-08)
Author (monograph)
CRACIUN, Valentin (Editor)1 2 ; GUILLOUX-VIRY, Maryline (Editor)3 ; ALEXE, Marin (Editor)4 ; COSTA KRÄMER, José L (Editor)5 ; MOSNIER, Jean-Paul (Editor)6
European Materials Research Society (EMRS), Strasbourg, France (Organiser of meeting)
[1] National Institute for Laser, Plasma and Radiation Physics, Bucharest, Romania
[2] University of Florida, United States
[3] University of Rennes 1, France
[4] Max Planck Institute of Microstructure Physics, Halle, Germany
[5] Instituto de Microelectronica de Madrid, Spain
[6] Dublin City University, Ireland
Source

Thin solid films. 2010, Vol 518, Num 16, pp 4556-4559, 4 p ; ref : 18 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Atomic layer deposition Diethylzinc Epitaxy Monocrystalline Zinc oxide
Keyword (fr)
Analyse diffraction RX Composé III-V Couche mince Croissance cristalline en phase vapeur Diagramme rotation Diffraction RX Epitaxie Mécanisme croissance Méthode couche atomique Nitrure de gallium Oxyde de zinc Photoluminescence Précurseur Réaction dirigée Semiconducteur III-V Structure cristalline Zinc 6855A 7855 8105E 8115K GaN Zn ZnO
Keyword (en)
X-ray diffraction analysis III-V compound Thin films Crystal growth from vapors Rocking curve XRD Epitaxy Growth mechanism Atomic layer method Gallium nitride Zinc oxide Photoluminescence Precursor Template reaction III-V semiconductors Crystal structure Zinc
Keyword (es)
Compuesto III-V Diagrama rotación Mecanismo crecimiento Método capa atómica Galio nitruro Zinc óxido Reacción dirigida
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H55 Photoluminescence

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A05 Specific materials / 001B80A05H Other semiconductors

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22944188

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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