Effect of bromide ions and polyethylene glycol on morphological control of electrodeposited copper foam
- Author
- KAI TAN1 ; TIAN, Min-Bo1 ; QIANG CAI1
[1] Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China - Source
Thin solid films. 2010, Vol 518, Num 18, pp 5159-5163, 5 p ; ref : 21 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- 3-dimensional Copper foam Electrodeposition Hydrogen evolution Porous
- Keyword (fr)
- Bromure de cuivre Cuivre Densité courant Densité élevée Dimension pore Dépôt électrolytique Ethylène oxyde polymère Ethylène oxyde polymère Matériau poreux Microstructure Morphologie Revêtement électrodéposé Synergie 6855J 8115P CuBr
- Keyword (en)
- Copper bromide Copper Current density High density Pore size Electrodeposition Ethylene oxide polymer Polyethylene glycols Porous materials Microstructure Morphology Electrodeposited coatings Synergism
- Keyword (es)
- Cobre bromuro Densidad elevada Dimensión poro Etileno óxido polímero
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 22962990
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2010.03.029 
https://dx.doi.org/10.1016/j.tsf.2010.03.029
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