Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=22962990

Effect of bromide ions and polyethylene glycol on morphological control of electrodeposited copper foam

Author
KAI TAN1 ; TIAN, Min-Bo1 ; QIANG CAI1
[1] Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
Source

Thin solid films. 2010, Vol 518, Num 18, pp 5159-5163, 5 p ; ref : 21 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
3-dimensional Copper foam Electrodeposition Hydrogen evolution Porous
Keyword (fr)
Bromure de cuivre Cuivre Densité courant Densité élevée Dimension pore Dépôt électrolytique Ethylène oxyde polymère Ethylène oxyde polymère Matériau poreux Microstructure Morphologie Revêtement électrodéposé Synergie 6855J 8115P CuBr
Keyword (en)
Copper bromide Copper Current density High density Pore size Electrodeposition Ethylene oxide polymer Polyethylene glycols Porous materials Microstructure Morphology Electrodeposited coatings Synergism
Keyword (es)
Cobre bromuro Densidad elevada Dimensión poro Etileno óxido polímero
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
22962990

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web