Reflectance anisotropy spectroscopy and the growth of low-dimensional materials
- Author
- SOBIESIERSKI, Z1 ; WESTWOOD, D. I1
[1] Department of Pkysics and Astronomy, University of Wales College Cardiff, P. O. Box 913, Cardiff CF2 3 YB, United Kingdom - Conference title
- 1997 ICAM/E-MRS Spring Conference, Symposium B: Epitaxial Thin Film Growth and Nanostructures
- Conference name
- 1997 ICAM/E-MRS Spring Conference, Symposium B: Epitaxial Thin Film Growth and Nanostructures (Strasbourg 1997-06-16)
- Author (monograph)
- RITTER, G (Editor)1 ; MATTHAI, C (Editor)2 ; TAKAI, O (Editor)3
E-MRS, Strasbourg, France (Funder/Sponsor)
Council of Europe, Strasbourg, France (Funder/Sponsor)
Commission of European Communities, Luxembourg, Luxembourg (Funder/Sponsor)
[1] Institute for Semiconductor Physics, Walter-Korsing-Str. 2, 15230 Frankfurt/Oder, Germany
[2] Department of Physics and Astronomy, University of Wales College of Cardiff, P.O. Box 913, Cardiff CF2 3YB, United Kingdom
[3] Department of Materials Processing Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-01, Japan - Source
Thin solid films. 1998, Vol 318, Num 1-2, pp 140-147 ; ref : 31 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Adsorption Analyse quantitative surface Anisotropie Coefficient réflexion Commande processus Croissance cristalline en phase vapeur Désorption Echange ion Epitaxie jet moléculaire Etude expérimentale Hydrogène ion Hétérojonction Méthode optique Silicium H Si
- Keyword (en)
- Adsorption Quantitative surface analysis Anisotropy Reflectance Process control Crystal growth from vapors Desorption Ion exchange Molecular beam epitaxy Experimental study Hydrogen ions Heterojunctions Optical method Silicon
- Keyword (es)
- Análisis cuantitativo superficie Coeficiente reflexión Método óptico
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H20 Optical properties of bulk materials and thin films / 001B70H20C Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy
- Pacs
- 7820C Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2302576
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(97)01153-X 
https://dx.doi.org/10.1016/S0040-6090(97)01153-X
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