Correlation between structural and opto-electronic properties of a-Si1-xCx:H films deposited by plasma enhanced chemical vapour deposition
- Autor
- AMBROSONE, G1 2 ; BASA, D. K3 ; COSCIA, U2 4 ; RAVA, P5
[1] CNR-SPIN, Complesso Universitario MSA, via Cintia, 80126, Napoli, Italy
[2] Dipartimento di Scienze Fisiche, Universita' di Napoli Federico II Complesso Universitario MSA, via Cintia, 80126 Napoli, Italy
[3] Department of Physics, Utkal University, Bhubaneswar-751004, India
[4] CNISM Unità di Napoli, Complesso Universitario MSA, via Cintia, 80126, Napoli, Italy
[5] Elettrorava Spa, via Don Sapino 178, 10078 Venaria, Torino, Italy - Fuente
Thin solid films. 2010, Vol 518, Num 20, pp 5871-5874, 4 p ; ref : 40 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Campo Científico
- Crystallography; Metallurgy, welding; Condensed state physics
- Editor
- Elsevier, Amsterdam
- País de la publicación
- Netherlands
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave de autor
- Amorphous materials Infrared spectroscopy Optical properties Semiconductors Structural properties
- Palabra clave (fr)
- Carbone Carbure de silicium Cavité dans réseau Couche mince Densité défaut Défaut cristallin Matériau amorphe hydrogéné Matériau amorphe Méthane Méthode PECVD Propriété optique Propriété optoélectronique Semiconducteur Silane Spectrométrie IR 6172Q 6855L 7866 8115G He a-C:H a-Si1-xCx:H a-Si:H
- Palabra clave (in)
- Carbon Silicon carbide Voids Thin films Defect density Crystal defects Amorphous hydrogenated material Amorphous material Methane PECVD Optical properties Optoelectronic properties Semiconductor materials Silanes Infrared spectroscopy
- Palabra clave (es)
- Silicio carburo Densidad defecto Material amorfo Propiedad optoelectrónica
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A72 Defects and impurities in crystals; microstructure / 001B60A72Q Microscopic defects (voids, inclusions, etc.)
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55L Defects and impurities: doping, implantation, distribution, concentration, etc
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Disciplina
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 23041724
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2010.05.089 
https://dx.doi.org/10.1016/j.tsf.2010.05.089
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