Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering
- Author
- STRANAK, Vitezslav1 2 ; QUAAS, Marion1 3 ; BOGDANOWICZ, Robert4 ; STEFFEN, Hartmut3 ; WULFF, Harm1 ; HUBICKA, Zdenek2 ; TICHY, Milan5 ; HIPPLER, Rainer1
[1] Institute of Physics, E.M.A. University of Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany
[2] Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Praha 8, Czech Republic
[3] Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany
[4] Faculty of Electronics, Telecommunication and Informatics, Gdansk University of Technology, Narutowicza Street 11/12, 80952 Gdansk, Poland
[5] Charles University in Prague, Faculty of Mathematics and Physics, V Holešovičkách 2, 180 00 Prague 8, Czech Republic - Source
Journal of physics. D, Applied physics (Print). 2010, Vol 43, Num 28 ; 285203.1-285203.7 ; ref : 72 ref
- CODEN
- JPAPBE
- ISSN
- 0022-3727
- Scientific domain
- Condensed state physics; Physics; Plasma physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Addition azote Bande interdite Concentration impureté Couche mince Diagnostic plasma Diffraction RX Dopage Dépôt laser pulsé Indice réfraction Liaison chimique Oxyde de titane Procédé dépôt Recuit thermique Spectre photoélectron RX Spectre résolution temporelle
- Keyword (en)
- Nitrogen additions Energy gap Impurity density Thin films Plasma diagnostics XRD Doping Pulsed laser deposition Refractive index Chemical bonds Titanium oxide Deposition process Thermal annealing X-ray photoelectron spectra Time resolved spectra
- Keyword (es)
- Concentración impureza Doping Titanio óxido Procedimiento revestimiento Recocido térmico
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films / 001B70H66L Other semiconductors
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15F Laser deposition
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23067346
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0022-3727/43/28/285203 
https://dx.doi.org/10.1088/0022-3727/43/28/285203
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