Monitoring Reticle Molecular Contamination in ASML EUV Alpha Demo Tool
- Author
- OKOROANYANWU, Uzodinma1 ; AIQIN JIANG2 ; LA FONTAINE, Bruno5 ; DITTMAR, Kornelia3 ; FAHR, Torsten3 ; LAURSEN, Thomas2 ; WOOD, Obert1 ; CUMMINGS, Kevin2 ; HOLFELD, Christian3 ; PETERS, Jan-Hendrik4 ; GULLIKSON, Eric6
[1] GLOBALFOUNDRIES, 257 Fuller Road, Albany, NY 12203, United States
[2] ASML, 25 Corporate Circle, Albany, NY 12203, United States
[3] GLOBALFOUNDRIES, Wilschdorfer Landstrasse 101, 01109 Dresden, Germany
[4] AMTC, Rahnitzer Allee 9, 01109 Dresden, Germany
[5] GLOBALFOUNDRIES, 1050 E. Arques Avenue, Sunnyvale, CA 94085, United States
[6] LBNL, 1 Cyclotron Road, Berkeley, CA 94720, United States - Conference title
- Extreme ultraviolet (EUV) lithography (22-25 February 2010, San Jose, California, United States)
- Conference name
- Extreme ultraviolet (EUV) lithography (EUV) lithography (San Jose CA 2010)
- Author (monograph)
- La Fontaine, Bruno M (Editor)
SEMATECH (Organiser of meeting)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636 ; 76360H.1-76360H.13 ; 2 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8050-7 0-8194-8050-9
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Basse pression Carbone Durabilité Fabrication industrielle Facteur réflexion Imagerie Implémentation Incidence rasante Lithographie UV Masque Microscopie électronique balayage Oxydation Oxyde Photolithographie Pression partielle Rayonnement UV extrême Réflectométrie Source lumière Source rayonnement Spectrométrie Auger Transformation Fourier 0130C 0779 4272 4282C 8540H
- Keyword (en)
- Low pressure Carbon Durability Manufacturing Reflectivity Imagery Implementation Grazing incidence Ultraviolet lithography Masks Scanning electron microscopy Oxidation Oxides Photolithography Partial pressure Extreme ultraviolet radiation Reflectometry Light sources Radiation sources AES Fourier transformation
- Keyword (es)
- Durabilidad Imaginería Incidencia rasante
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G79 Scanning probe microscopes, components and techniques
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics Metrology Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23095799
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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