The Evolution of Patterning Process Models in Computational Lithography
- Author
- STURTEVANT, John L1
[1] Mentor Graphics Corp, Wilsonville, OR 97070, United States - Conference title
- Advances in resist materials and processing technology XXVII (22-24 February 2010, San Jose, California, United States)
- Conference name
- Advances in resist materials and processing technology (27 ; San Jose CA 2010)
- Author (monograph)
- Allen, Robert D (Editor); Somervell, Mark Howell (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639 ; 763902.1-763902.13 ; 2 ; ref : 30 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8053-8 0-8194-8053-3
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Adressage Défaillance Evaluation performance Industrie électronique Lithographie Photorésist Temps exécution 0130C 4282
- Keyword (en)
- Addressing Failures Performance evaluation Electronics industry Lithography Photoresists Execution time
- Keyword (es)
- Direccionamiento Tiempo ejecución
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23155897
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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