Monitor Technology of Outer Circumstances for Mask EB Writing System
- Author
- HOSHI, H1 ; SAMOTO, N1 ; MANABE, H1 ; WAKIMOTO, O1 ; IIDA, S1 ; YAMABE, M1
[1] Akishima Branch Laboratory Mask Writing Equipment Technology Research Laboratory Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) Association of Super-Advanced Electronics Technologies (ASET) 1-2, Musashino 3-chome, Akishima, Tokyo 196-8558, Japan - Conference title
- Photomask and next-generation lithography mask technology XVII (13-15 April 2010, Yokohama, Japan)
- Conference name
- Photomask and next generation lithography mask technology (17 ; Yokohama 2010)
- Author (monograph)
- Hosono, Kunihiro (Editor)
SPIE, United States (Organiser of meeting)
Photomask Japan, Japan (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748 ; 1Vol ; 774817.1-774817.8 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 0-8194-8238-2 978-0-8194-8238-9
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Aide diagnostic Coût fabrication Effet environnement Endommagement Evaluation performance Fabrication microélectronique Fiabilité Largeur raie Masque Moniteur Optimisation Photolithographie Simulateur Système intégré Technologie avancée Traitement donnée Transmission donnée
- Keyword (en)
- Diagnostic aid Manufacturing cost Environmental effect Damaging Performance evaluation Microelectronic fabrication Reliability Line width Mask Monitor Optimization Photolithography Simulator Integrated system Advanced technology Data processing Data transmission
- Keyword (es)
- Ayuda diagnóstica Costo fabricación Efecto medio ambiente Deterioración Evaluación prestación Fabricación microeléctrica Fiabilidad Anchura raya espectral Máscara Monitor Optimización Fotolitografía Simulador Sistema integrado Tecnología avanzada Tratamiento datos Transmisión datos
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23399773
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.864043 
https://dx.doi.org/10.1117/12.864043
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