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Intentionally positioned self-assembled InAs quantum dots in an electroluminescent p-i-n junction diode

Author
MEHTA, Minisha1 ; REUTER, Dirk2 ; MELNIKOV, Alexander2 ; WIECK, Andreas D2 ; MICHAELIS DE VASCONCELLOS, Steffen1 ; BAUMGARTEN, Tim1 ; ZRENNER, Artur1 ; MEIER, Cedrik1
[1] Physics Department and Center for Optoelectronics and Photonics Paderborn (CeOPP), University of Poderborn, Warburger Str. 100, 33098 Paderborn, Germany
[2] Applied Solid State Physics, Ruhr-University of Bochum, Universitätsstrasse 150, 44780 Bochum, Germany
Conference title
Proceedings of the 14th International Conference on Modulated Semiconductor Structures (MSS14)
Conference name
International Conference on Modulated Semiconductor Structures (MSS14) (MSS14) (14 ; Kobe 2009-07-19)
Author (monograph)
OHNO, Hideo (Editor)1 ; WOO, Jong-Chun (Editor)2 ; YOSHINO, Junji (Editor)3 ; HIRAKAWA, Kazuhiko (Editor)4 ; MOTOHISA, Junichi (Editor)5
[1] Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
[2] Seoul National University, Seoul 151-747, Korea, Republic of
[3] Department of Physics, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8551, Japan
[4] Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
[5] Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Kita-ku, Sapporo 060-0814, Hokkaido, Japan
Source

Physica. E, low-dimentional systems and nanostructures. 2010, Vol 42, Num 10, pp 2749-2752, 4 p ; ref : 13 ref

ISSN
1386-9477
Scientific domain
Crystallography; Electronics; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Electroluminescence Focused ion beam Molecular beam epitaxy Self-assembled quantum dot
Keyword (fr)
Arséniure d'indium Arséniure de gallium Autoassemblage Composé III-V Croissance sélective Diode couche intrinsèque Electroluminescence Epitaxie jet moléculaire Etat excité Faisceau ion Implantation ion Jonction p i n Mécanisme croissance Nanomatériau Point quantique Recombinaison radiative Recuit Réseau(arrangement) Semiconducteur III-V Synthèse nanomatériau Sélectivité Transition interbande Ultravide Vide poussé 8107B 8107T 8116D 8535B Substrat GaAs
Keyword (en)
Indium arsenides Gallium arsenides Self-assembly III-V compound Selective growth p i n diodes Electroluminescence Molecular beam epitaxy Excited states Ion beams Ion implantation p i n junctions Growth mechanism Nanostructured materials Quantum dots Radiative recombination Annealing Arrays III-V semiconductors Nanomaterial synthesis Selectivity Interband transitions Ultrahigh vacuum High vacuum
Keyword (es)
Compuesto III-V Mecanismo crecimiento Recombinación radiativa Síntesis nanomaterial Selectividad
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07B Nanocrystalline materials

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07T Quantum dots

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16D Self-assembly

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F18 Molecular electronics, nanoelectronics

Discipline
Electronics Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
23454060

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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