A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation
- Autor
- ZONGTAO ZHU1 ; CHUNZHI GONG1 ; ZHIJIAN WANG1 ; XIUBO TIAN1 ; YI LI1 ; SHIQIN YANG1 ; FU, Ricky K. Y2 ; CHU, Paul K2
[1] State Key Laboratory of Advanced Welding Production Technology, School of Material Science and Engineering, Harbin Institute of Technology, Harbin 150001, China
[2] Department of Physics and Materials Science, City University of Hong Kong, Kowloon, Hong-Kong - Titulo de la publicación
- SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE
- Autor ( monografía)
- YUKIMURA, Ken (Editor)1 ; EHIASARIAN, Arutiun P (Editor)2
[1] National Institute of Advanced Industrial Science and Technologyjpn, Tsukuba 305-8568, Japan
[2] Sheffield Hallam University, S1 1WB Sheffield, United Kingdom - Fuente
IEEE transactions on plasma science. 2010, Vol 38, Num 11, pp 3083-3088, 6 p ; 1 ; ref : 13 ref
- CODEN
- ITPSBD
- ISSN
- 0093-3813
- Campo Científico
- Nuclear physics; Plasma physics
- Editor
- Institute of Electrical and Electronics Engineers, New York, NY
- País de la publicación
- United States
- Tipo de documento
- Article
- Idioma
- English
- Palabra clave de autor
- Ion implantation plasma sheath programmable logic controller (PLC) pulse modulator
- Palabra clave (fr)
- Application plasma Conception Etude théorique Gaine plasma Implantation ion immersion plasma Implantation ion Simulation numérique Spectre énergie Traitement par plasma Traitement surface 5240K 5277D
- Palabra clave (in)
- Plasma applications Design Theoretical study Plasma sheaths Plasma immersion ion implantation Ion implantation Digital simulation Energy spectra Plasma assisted processing Surface treatments
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B40 Plasma interactions (nonlaser) / 001B50B40K Plasma sheaths
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77D Plasma-based ion implantation and deposition
- Disciplina
- Physics of gases, plasmas and electric discharges
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 23669609
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/TPS.2010.2051166 
https://dx.doi.org/10.1109/TPS.2010.2051166
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:2:\"11\";s:8:\"\u0000*\u0000spage\";s:4:\"3083\";s:8:\"\u0000*\u0000epage\";s:4:\"3088\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:11:\"ZONGTAO ZHU\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"CHUNZHI GONG\";i:1;s:12:\"ZHIJIAN WANG\";i:2;s:10:\"XIUBO TIAN\";i:3;s:5:\"YI LI\";i:4;s:11:\"SHIQIN YANG\";i:5;s:14:\"FU, Ricky K. Y\";i:6;s:11:\"CHU, Paul K\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:53:\"SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE\";s:8:\"\u0000*\u0000title\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Panist
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:2:\"11\";s:8:\"\u0000*\u0000spage\";s:4:\"3083\";s:8:\"\u0000*\u0000epage\";s:4:\"3088\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:11:\"ZONGTAO ZHU\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"CHUNZHI GONG\";i:1;s:12:\"ZHIJIAN WANG\";i:2;s:10:\"XIUBO TIAN\";i:3;s:5:\"YI LI\";i:4;s:11:\"SHIQIN YANG\";i:5;s:14:\"FU, Ricky K. Y\";i:6;s:11:\"CHU, Paul K\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:53:\"SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE\";s:8:\"\u0000*\u0000title\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Istex
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Acceso mediante Unpaywall
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:2:\"11\";s:8:\"\u0000*\u0000spage\";s:4:\"3083\";s:8:\"\u0000*\u0000epage\";s:4:\"3088\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:11:\"ZONGTAO ZHU\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"CHUNZHI GONG\";i:1;s:12:\"ZHIJIAN WANG\";i:2;s:10:\"XIUBO TIAN\";i:3;s:5:\"YI LI\";i:4;s:11:\"SHIQIN YANG\";i:5;s:14:\"FU, Ricky K. Y\";i:6;s:11:\"CHU, Paul K\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:53:\"SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE\";s:8:\"\u0000*\u0000title\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Europe PubMed Central
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:2:\"11\";s:8:\"\u0000*\u0000spage\";s:4:\"3083\";s:8:\"\u0000*\u0000epage\";s:4:\"3088\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:11:\"ZONGTAO ZHU\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"CHUNZHI GONG\";i:1;s:12:\"ZHIJIAN WANG\";i:2;s:10:\"XIUBO TIAN\";i:3;s:5:\"YI LI\";i:4;s:11:\"SHIQIN YANG\";i:5;s:14:\"FU, Ricky K. Y\";i:6;s:11:\"CHU, Paul K\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:53:\"SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE\";s:8:\"\u0000*\u0000title\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante Base Search
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:24:\"10.1109\/TPS.2010.2051166\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:9:\"\u0000*\u0000jtitle\";s:35:\"IEEE transactions on plasma science\";s:9:\"\u0000*\u0000stitle\";s:22:\"IEEE trans. plasma sci\";s:7:\"\u0000*\u0000date\";s:4:\"2010\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:2:\"11\";s:8:\"\u0000*\u0000spage\";s:4:\"3083\";s:8:\"\u0000*\u0000epage\";s:4:\"3088\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0093-3813\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:11:\"ZONGTAO ZHU\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"CHUNZHI GONG\";i:1;s:12:\"ZHIJIAN WANG\";i:2;s:10:\"XIUBO TIAN\";i:3;s:5:\"YI LI\";i:4;s:11:\"SHIQIN YANG\";i:5;s:14:\"FU, Ricky K. Y\";i:6;s:11:\"CHU, Paul K\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITPSBD\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:1:\"1\";s:9:\"\u0000*\u0000btitle\";s:53:\"SPECIAL ISSUE ON HiPIMS AND HIGH POWER GLOW DISCHARGE\";s:8:\"\u0000*\u0000title\";s:97:\"A Specially Designed PLC-Based High-Voltage Pulse Modulator for Plasma Immersion Ion Implantation\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Acceso mediante arXiv
