Monte Carlo simulation of electron beam lithography on topographical substrates
- Author
- ZHENG CUI1
[1] Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot Oxon OX11 0QX, United Kingdom - Conference title
- Micro- and Nano-Engineering MNE 97 International Conference on Micro- and Nanofabrication
- Conference name
- Micro- and Nano-Engineering MNE 97 International Conference on Micro- and Nanofabrication (Athens 1998-09-15)
- Author (monograph)
- HATZAKIS, M (Editor)1 ; GOGOLIDES, E (Editor)1
[1] NCSR Demokritos, Aghia Paraskevi, Greece - Source
Microelectronic engineering. 1998, Vol 41-42, pp 175-178 ; ref : 3 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Scientific domain
- Electronics
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Fabrication microélectronique Lithographie faisceau électron Modèle 3 dimensions Méthode Monte Carlo Simulation Surface topographique Nuage électronique
- Keyword (en)
- Microelectronic fabrication Electron beam lithography Three dimensional model Monte Carlo method Simulation Topographic surface
- Keyword (es)
- Fabricación microeléctrica Litografía haz electrón Modelo 3 dimensiones Método Monte Carlo Simulación Superficie topográfica
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2368824
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0167-9317(98)00039-2 
https://dx.doi.org/10.1016/S0167-9317(98)00039-2
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