Inspection technique for nanoimprint template with mirror electron microscopy
- Author
- SHIMAKURA, Tomokazu1 ; HASEGAWA, Masaki1 ; SUZUKI, Hiroshi1 ; OHTA, Hiroya1
[1] Central Research Lab. Hitachi Ltd., 1-280 Higashi-koigakubo, Kokubunji, Tokyo 185-8601, Japan - Conference title
- Photomask technology 2010 (13-16 September 2010, Monterey, California, United States)
- Conference name
- Photomask technology (Monterey CA 2010)
- Author (monograph)
- Montgomery, M. Warren (Editor); Maurer, Wilhelm (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823 ; 78230Q.1-78230Q.6 ; 2 ; ref : 8 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8337-9
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Dispositif microélectromécanique Détection défaut Microscope électronique Microscopie électronique balayage Microscopie électronique Miroir Nanolithographie 0779 4279B 8585
- Keyword (en)
- Microelectromechanical device Defect detection Electron microscope Scanning electron microscopy Electron microscopy Mirror Nanolithography
- Keyword (es)
- Dispositivo microelectromecánico Detección imperfección Microscopio electrónico Microscopía electrónica barrido Microscopía electrónica Espejo
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B79 Optical elements, devices, and systems / 001B40B79B Lenses, prisms, and mirrors
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03B Testing, measurement, noise and reliability
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F21 Micro- and nanoelectromechanical devices (mems/nems)
- Discipline
- Electronics Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23771303
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.864090 
https://dx.doi.org/10.1117/12.864090
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