Multi-Shaped-Beam (MSB): an evolutionary approach for high throughput e-beam lithography
- Author
- SLODOWSKI, Matthias1 ; DÖRING, Hans-Joachim1 ; STOLBERG, Ines A1 ; DORL, Wolfgang1
[1] Vistec Electron Beam GmbH, Göschwitzer Str. 25, 07745 Jena, Germany - Conference title
- Photomask technology 2010 (13-16 September 2010, Monterey, California, United States)
- Conference name
- Photomask technology (Monterey CA 2010)
- Author (monograph)
- Montgomery, M. Warren (Editor); Maurer, Wilhelm (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823 ; 78231J.1-78231J.8 ; 2 ; ref : 7 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8337-9
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Apprentissage Calcul évolutionniste Circuit intégré Composé du silicium Densité intégration Dispositif microélectromécanique Ecriture faisceau électronique Faisceau électronique Flexibilité Haute résolution Lithographie faisceau électron Lithographie sans masque Mise en forme faisceau Packaging électronique Pixel Rayonnement UV extrême 8585
- Keyword (en)
- Learning Evolutionary computation Integrated circuit Silicon compound Integration density Microelectromechanical device Electron beam writing Electron beam Flexibility High resolution Electron beam lithography Maskless lithography Beam shaping Electronic packaging Pixel Vacuum ultraviolet radiation
- Keyword (es)
- Aprendizaje Circuito integrado Silicio compuesto Densidad integración Dispositivo microelectromecánico Escritura haz electrónico Haz electrónico Flexibilidad Alta resolucion Litografía haz electrón Litografía sin máscara Puesta forma haz Packaging electrónico Pixel Radiación ultravioleta extrema
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F21 Micro- and nanoelectromechanical devices (mems/nems)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 23771322
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.868977 
https://dx.doi.org/10.1117/12.868977
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