Insights into surface reactions during a-sSiGe:H deposition and hydrogen plasma annealing as obtained from infrared attenuated total reflection spectroscopy
- Author
- NAKAGAWA, K1 ; YOSHIDA, Y1 ; MIYAZAKI, S1 ; HIROSE, M1
[1] Department of Electrical Engineering, Hiroshima University, Higashi-Hiroshima 739, Japan - Conference title
- ICAMS 17 International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology
- Conference name
- ICAMS 17 International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (17 ; Budapest 1997-08-25)
- Author (monograph)
- KUGLER, Sándor (Editor)1 ; STUTZMANN, Martin (Editor)2
International Union for Pure and Applied Physics, International (Funder/Sponsor)
JEOL (Europe) S.A (Funder/Sponsor)
Technical University of Budapest, Hungary (Funder/Sponsor)
Research Institute for Technical Physics (Funder/Sponsor)
Fujitsu Ltd (Funder/Sponsor)
KANEKA Co (Funder/Sponsor)
Mitsui Toatsu Chemicals Inc (Funder/Sponsor)
Sanyo Electric Co., Ltd (Funder/Sponsor)
Xerox PARC (Funder/Sponsor)
Budapest University of Economic Sciences, Hungary (Funder/Sponsor)
National Committee for Technological Development (Funder/Sponsor)
Hungarian Academy of Sciences, Hungary (Funder/Sponsor)
[1] Institute of Physics, Technical University of Budapest, Budapest, Hungary
[2] Walter Schottky Institute, Technische Universität München, 85748 Garching, Germany - Source
Journal of non-crystalline solids. 1998, Vol 227-30, pp 48-52 ; a ; ref : 17 ref
- CODEN
- JNCSBJ
- ISSN
- 0022-3093
- Scientific domain
- Crystallography; Chemical industry parachemical industry; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Alliage binaire Cinétique Composition chimique Dépendance temps Dépôt plasma Etat amorphe Etude expérimentale Film Germanium alliage Liaison chimique Matériau amorphe hydrogéné Recuit Réaction surface Silicium alliage Solution solide Spectre IR Transformation Fourier Ge Si a-Si1-xGex:H Non métal
- Keyword (en)
- Binary alloys Kinetics Chemical composition Time dependence Plasma deposition Amorphous state Experimental study Films Germanium alloys Chemical bonds Amorphous hydrogenated material Annealing Surface reactions Silicon alloys Solid solutions Infrared spectra Fourier transformation Nonmetals
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2391977
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0022-3093(98)00019-2 
https://dx.doi.org/10.1016/S0022-3093(98)00019-2
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