Perspectives in nanoscale plasma etching: what are the ultimate limits?
- Author
- MARCHACK, Nathan1 ; CHANG, Jane P1
[1] Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, California 90095, United States - Source
Journal of physics. D, Applied physics (Print). 2011, Vol 44, Num 17 ; 174011.1-174011.11 ; ref : 135 ref
- CODEN
- JPAPBE
- ISSN
- 0022-3727
- Scientific domain
- Condensed state physics; Physics; Plasma physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Echelle nanométrique Fabrication microélectronique Gravure plasma Nanostructure Polymère Propriété chimique Propriété physique Réseau(arrangement) Semiconducteur 5277B 6865 8116R 8540H
- Keyword (en)
- Nanometer scale Microelectronic fabrication Plasma etching Nanostructures Polymers Chemical properties Physical properties Arrays Semiconductor materials
- Keyword (es)
- Fabricación microeléctrica Grabado plasma
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77B Etching and cleaning
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H65 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16R Nanoscale pattern formation
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Physics and materials science Physics of condensed state : structure, mechanical and thermal properties Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24142885
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0022-3727/44/17/174011 
https://dx.doi.org/10.1088/0022-3727/44/17/174011
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