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Electrochemical process for advanced package fabrication

Author
KRONGELB, S1 ; ROMANKIW, T1 ; TORNELLO, A1
[1] IBM Research Division, Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598, United States
Source

IBM journal of research and development. 1998, Vol 42, Num 5, pp 575-585 ; ref : 21 ref

CODEN
IBMJAE
ISSN
0018-8646
Scientific domain
Electronics; Computer science
Publisher
International Business Machines, Armonk, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Boîtier Cuivre Dépôt par oxydoréduction Electrolyte Etude expérimentale Fabrication microélectronique Méthode électrochimique Placage
Keyword (en)
Package Copper Electroless plating Electrolyte Experimental study Microelectronic fabrication Electrochemical method Plating
Keyword (es)
Estuche Cobre Depósito por oxidorreducción Electrolito Estudio experimental Fabricación microeléctrica Método electroquímico Enchapado
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03D Electronic equipment and fabrication. Passive components, printed wiring boards, connectics

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2421717

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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