The Resist-core Spacer Patterning Process for Fabrication of 2xnm Node Semiconductor Devices
- Author
- SHO, Koutarou1 ; OORI, Tomoya1 ; IIDA, Kazunori1 ; KOBAYASHI, Katsutoshi1 ; KIKUTANI, Keisuke1 ; YAMAMOTO, Katsumi1 ; AISO, Fumiki1 ; MATSUNAGA, Kentaro1 ; SHIOBARA, Eishi1 ; HASHIMOTO, Koji1
[1] Toshiba Corporation, Semiconductor Company, Advanced Memory Development Center 800, Yamanoissiki-cho, Yokkaichi, Mie-Pref, 512-8550, Japan - Conference title
- Advances in resist materials and processing technology XXVIII (28 February-2 March 2011, San Jose, California, United States)
- Conference name
- Advances in resist materials and processing technology (28 ; San Jose CA 2011)
- Author (monograph)
- Allen, Robert D (Editor); Somervell, Mark Howell (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972 ; 79720C.1-79720C.11 ; 2 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8531-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Cale espacement Contrôlabilité Dispositif semiconducteur Eclairement Endommagement Fabrication microélectronique Gravure Haute résolution Photolithographie Résist Scanneur Masque dur
- Keyword (en)
- Spacer Controllability Semiconductor device Illumination Damaging Microelectronic fabrication Engraving High resolution Photolithography Resist Scanner Hard mask
- Keyword (es)
- Calce espaciamiento Controlabilidad Dispositivo semiconductor Alumbrado Deterioración Fabricación microeléctrica Grabado Alta resolucion Fotolitografía Resistencia Escáner
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F16 Imaging devices
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24459614
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.877616 
https://dx.doi.org/10.1117/12.877616
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