The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and mask
- Author
- HIBINO, Daisuke1 ; HOJYO, Yutaka2 ; SHINDO, Hiroyuki2 ; DO, Thuy3 ; DAVE, Aasutosh1 ; LIN, Tim3 ; KUSNADI, Ir3 ; STURTEVANT, John L3
[1] Semiconductor Equipment Business Group, Hitachi High-Technologies Corporation, 24-14, Nishi-Shimbashi, 1-chome, Minato-ku, Tokyo 105-8717, Japan
[2] Nanotechnology Products Business Group, Hitachi High-Technologies Corporation, 882, Ichige, Hitachinaka-shi, Ibaraki-ken 312-8504, Japan
[3] Mentor Graphics Corporation, 46871 Bayside Parkway, Fremont, CA 94538, United States - Conference title
- Metrology, inspection, and process control for microlithography XXV (28 February-3 March 2011, San Jose, [California], United States)
- Conference name
- Metrology, inspection, and process control for microlithography (25 ; San Jose CA 2011)
- Author (monograph)
- Raymond, Christopher J (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971 ; 79712G.1-79712G.9 ; 2 ; ref : 9 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8530-4
- Scientific domain
- Electronics; Metrology and instrumentation; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Correction optique de proximité Détection contour Etalonnage Evaluation performance Fabrication microélectronique Lithographie Microscopie électronique balayage Modélisation Méthode mesure Pastille électronique Taille critique Temps exécution 0130C 0790 4282C
- Keyword (en)
- Optical proximity correction Edge detection Calibration Performance evaluation Microelectronic fabrication Lithography Scanning electron microscopy Modelling Measuring methods Wafers Critical size Execution time
- Keyword (es)
- Corrección de proximidad óptica Fabricación microeléctrica Tiempo ejecución
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00A Communication, education, history, and philosophy / 001B00A30 Physics literature and publications / 001B00A30C Conference proceedings
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G90 Other topics in instruments, apparatus, components and techniques common to several branches of physics and astronomy
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03G Electric, optical and optoelectronic circuits / 001D03G02 Circuit properties / 001D03G02C Optical and optoelectronic circuits / 001D03G02C1 Integrated optics. Optical fibers and wave guides
- Discipline
- Electronics Metrology Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24459924
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.898843 
https://dx.doi.org/10.1117/12.898843
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