The SEMATECH Berkeley MET: extending EUV learning to 16-nm half pitch
- Author
- ANDERSON, Christopher N1 ; MAE BACLEA-AN, Lorie1 ; DENHAM, Paul E1 ; GEORGE, Simi A1 ; GOLDBERG, Kenneth A1 ; JONES, Michael S1 ; SMITH, Nathan S1 ; WALLOW, Thomas A2 ; MONTGOMERY, Warren3 ; NAULLEAU, Patrick P1
[1] Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States
[2] Global Foundries, Milpitas, CA 95035, United States
[3] SEMATECH, Albany, NY 12203, United States - Conference title
- Extreme ultraviolet (EUV) lithography II (28 February - 3 March 2011, San Jose CA US)
- Conference name
- Extreme ultraviolet lithography (02 ; San Jose CA 2011)
- Author (monograph)
- La Fontaine, Bruno M (Editor); Naulleau, Patrick P (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969 ; 79690R.1-79690R.6 ; 2 ; ref : 6 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8528-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Apprentissage Contraste image Dipôle Eclairement Evaluation performance Fabrication microélectronique Lithographie Masque déphasage Optimisation Ouverture numérique Rayonnement UV extrême Résist amplification chimique
- Keyword (en)
- Learning Image contrast Dipole Illumination Performance evaluation Microelectronic fabrication Lithography Phase shifting masks Optimization Numerical aperture Vacuum ultraviolet radiation Chemically amplified resist
- Keyword (es)
- Aprendizaje Imagen contraste Dipolo Alumbrado Evaluación prestación Fabricación microeléctrica Litografía Optimización Abertura numérica Radiación ultravioleta extrema Resistencia amplificación química
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24489532
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.881573 
https://dx.doi.org/10.1117/12.881573
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