EUV Lithography at Chipmakers has started: Performance Validation of ASML's NXE:3100
- Author
- WAGNER, Christian1 ; BACELAR, Jose1 ; MEILING, Hans1 ; OCKWELL, David1 ; PEETERS, Rudy1 ; VAN SETTEN, Eelco1 ; STOELDRAIJER, Judon1 ; YOUNG, Stuart1 ; ZIMMERMAN, John1 ; KOOL, Ron1 ; HARNED, Noreen1 ; LOOPSTRA, Erik1 ; HENDRIKS, Stef1 ; DE JONG, Ivo1 ; KUERZ, Peter2 ; LEVASIER, Leon1 ; VAN DE KERKHOF, Mark1 ; LOWISCH, Martin2
[1] ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, Netherlands
[2] Carl Zeiss SMT AG, 73446 Oberkochen, Germany - Conference title
- Extreme ultraviolet (EUV) lithography II (28 February - 3 March 2011, San Jose CA US)
- Conference name
- Extreme ultraviolet lithography (02 ; San Jose CA 2011)
- Author (monograph)
- La Fontaine, Bruno M (Editor); Naulleau, Patrick P (Editor)
SPIE, United States (Organiser of meeting) - Source
Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969 ; 79691F.1-79691F.12 ; 2 ; ref : 8 ref
- CODEN
- PSISDG
- ISSN
- 0277-786X
- ISBN
- 978-0-8194-8528-1
- Scientific domain
- Electronics; Optics; Physics
- Publisher
- SPIE, Bellingham, Wash
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Evaluation performance Fabrication microélectronique Formation image Illumination hors axe Implémentation Intégration au niveau système Lithographie UV Mise à jour Photolithographie Rayonnement UV extrême
- Keyword (en)
- Performance evaluation Microelectronic fabrication Imaging Off axis illumination Implementation System level integration UV lithography Updating Photolithography Vacuum ultraviolet radiation
- Keyword (es)
- Evaluación prestación Fabricación microeléctrica Formación imagen Iluminación fuera de eje Implementación Integración a nivel de sistema Litografía UV Actualización Fotolitografía Radiación ultravioleta extrema
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24489556
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1117/12.878603 
https://dx.doi.org/10.1117/12.878603
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