Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors
- Author
- KUI YAO1 ; SHUTING CHEN1 2 ; RAHIMABADY, Mojtaba1 2 ; MEYSAM SHARIFZADEH MIRSHEKARLOO1 3 ; SHUHUI YU1 2 ; ENG HOCK TAY, Francis2 ; SRITHARAN, Thirumany3 ; LI LU2
[1] Institute of Materials Research and Engineering, A-STAR Agency for Science, Technology and Research, Singapore
[2] Department of Mechanical Engineering, National University of Singapore, Singapore
[3] School of Materials Science and Engineering, Nanyang Technological University, Singapore - Conference name
- Joint Meeting of the International Symposium on the Applications of ferroelectrics and the European Conference on the Applications of Polar Dielectrics (Edinburgh 2010-08-09)
- Source
IEEE transactions on ultrasonics, ferroelectrics, and frequency control. 2011, Vol 58, Num 9, pp 1968-1974, 7 p ; ref : 39 ref
- CODEN
- ITUCER
- ISSN
- 0885-3010
- Scientific domain
- Electronics; Mechanics acoustics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Accumulation énergie Batterie Condensateur Couche mince Dispositif couche mince Diélectrique Effet non linéaire Energie électrique Ferroélectricité Porteur charge Propriété électrochimique Puissance sortie Relaxeur Revêtement céramique Couche mince ferroélectrique Magnoniobate de plomb Titanate de plomb
- Keyword (en)
- Energy storage Battery Capacitors Thin films Thin film devices Dielectric materials Non linear effect Electric energy Ferroelectricity Charge carriers Electrochemical properties Output power Relaxor Ceramic coating Ferroelectric thin films Lead magnesium niobates Lead titanates
- Keyword (es)
- Batería Dieléctrico Efecto no lineal Energía eléctrica Propiedad electroquímica Potencia salida Revestimiento cerámico Capa fina ferroeléctrica Niobato de Magnesio y plomo Titanato de plomo
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70G Dielectrics, piezoelectrics, and ferroelectrics and their properties / 001B70G55 Dielectric thin films
- Discipline
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24513468
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1109/TUFFC.2011.2039 
https://dx.doi.org/10.1109/TUFFC.2011.2039
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:9:\"\u0000*\u0000jtitle\";s:71:\"IEEE transactions on ultrasonics, ferroelectrics, and frequency control\";s:9:\"\u0000*\u0000stitle\";s:48:\"IEEE trans. ultrason. ferroelectr. freq. control\";s:7:\"\u0000*\u0000date\";s:4:\"2011\";s:9:\"\u0000*\u0000volume\";s:2:\"58\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"1968\";s:8:\"\u0000*\u0000epage\";s:4:\"1974\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0885-3010\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"KUI YAO\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"SHUTING CHEN\";i:1;s:19:\"RAHIMABADY, Mojtaba\";i:2;s:31:\"MEYSAM SHARIFZADEH MIRSHEKARLOO\";i:3;s:9:\"SHUHUI YU\";i:4;s:21:\"ENG HOCK TAY, Francis\";i:5;s:20:\"SRITHARAN, Thirumany\";i:6;s:5:\"LI LU\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITUCER\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"7\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:9:\"\u0000*\u0000jtitle\";s:71:\"IEEE transactions on ultrasonics, ferroelectrics, and frequency control\";s:9:\"\u0000*\u0000stitle\";s:48:\"IEEE trans. ultrason. ferroelectr. freq. control\";s:7:\"\u0000*\u0000date\";s:4:\"2011\";s:9:\"\u0000*\u0000volume\";s:2:\"58\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"1968\";s:8:\"\u0000*\u0000epage\";s:4:\"1974\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0885-3010\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"KUI YAO\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"SHUTING CHEN\";i:1;s:19:\"RAHIMABADY, Mojtaba\";i:2;s:31:\"MEYSAM SHARIFZADEH MIRSHEKARLOO\";i:3;s:9:\"SHUHUI YU\";i:4;s:21:\"ENG HOCK TAY, Francis\";i:5;s:20:\"SRITHARAN, Thirumany\";i:6;s:5:\"LI LU\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITUCER\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"7\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:9:\"\u0000*\u0000jtitle\";s:71:\"IEEE transactions on ultrasonics, ferroelectrics, and frequency control\";s:9:\"\u0000*\u0000stitle\";s:48:\"IEEE trans. ultrason. ferroelectr. freq. control\";s:7:\"\u0000*\u0000date\";s:4:\"2011\";s:9:\"\u0000*\u0000volume\";s:2:\"58\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"1968\";s:8:\"\u0000*\u0000epage\";s:4:\"1974\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0885-3010\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"KUI YAO\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"SHUTING CHEN\";i:1;s:19:\"RAHIMABADY, Mojtaba\";i:2;s:31:\"MEYSAM SHARIFZADEH MIRSHEKARLOO\";i:3;s:9:\"SHUHUI YU\";i:4;s:21:\"ENG HOCK TAY, Francis\";i:5;s:20:\"SRITHARAN, Thirumany\";i:6;s:5:\"LI LU\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITUCER\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"7\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:9:\"\u0000*\u0000jtitle\";s:71:\"IEEE transactions on ultrasonics, ferroelectrics, and frequency control\";s:9:\"\u0000*\u0000stitle\";s:48:\"IEEE trans. ultrason. ferroelectr. freq. control\";s:7:\"\u0000*\u0000date\";s:4:\"2011\";s:9:\"\u0000*\u0000volume\";s:2:\"58\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"1968\";s:8:\"\u0000*\u0000epage\";s:4:\"1974\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0885-3010\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"KUI YAO\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"SHUTING CHEN\";i:1;s:19:\"RAHIMABADY, Mojtaba\";i:2;s:31:\"MEYSAM SHARIFZADEH MIRSHEKARLOO\";i:3;s:9:\"SHUHUI YU\";i:4;s:21:\"ENG HOCK TAY, Francis\";i:5;s:20:\"SRITHARAN, Thirumany\";i:6;s:5:\"LI LU\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITUCER\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"7\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:23:\"10.1109\/TUFFC.2011.2039\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:9:\"\u0000*\u0000jtitle\";s:71:\"IEEE transactions on ultrasonics, ferroelectrics, and frequency control\";s:9:\"\u0000*\u0000stitle\";s:48:\"IEEE trans. ultrason. ferroelectr. freq. control\";s:7:\"\u0000*\u0000date\";s:4:\"2011\";s:9:\"\u0000*\u0000volume\";s:2:\"58\";s:8:\"\u0000*\u0000issue\";s:1:\"9\";s:8:\"\u0000*\u0000spage\";s:4:\"1968\";s:8:\"\u0000*\u0000epage\";s:4:\"1974\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0885-3010\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"KUI YAO\";s:10:\"\u0000*\u0000aufirst\";s:0:\"\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:12:\"SHUTING CHEN\";i:1;s:19:\"RAHIMABADY, Mojtaba\";i:2;s:31:\"MEYSAM SHARIFZADEH MIRSHEKARLOO\";i:3;s:9:\"SHUHUI YU\";i:4;s:21:\"ENG HOCK TAY, Francis\";i:5;s:20:\"SRITHARAN, Thirumany\";i:6;s:5:\"LI LU\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ITUCER\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:131:\"Nonlinear Dielectric Thin Films for High-Power Electric Storage With Energy Density Comparable With Electrochemical Supercapacitors\";s:8:\"\u0000*\u0000place\";s:12:\"New York, NY\";s:6:\"\u0000*\u0000pub\";s:49:\"Institute of Electrical and Electronics Engineers\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"7\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
