Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24724355

Polymers in conventional and alternative lithography for the fabrication of nanostructures

Author
ACIKGOZ, Canet1 2 ; HEMPENIUS, Mark A1 ; HUSKENS, Jurriaan2 ; JULIUS VANCSO, G1
[1] Materials Science and Technology of Polymers, MESA' Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
[2] Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, Netherlands
Source

European polymer journal. 2011, Vol 47, Num 11, pp 2033-2052, 20 p ; ref : 170 ref

CODEN
EUPJAG
ISSN
0014-3057
Scientific domain
Polymers, paint and wood industries
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
Alternative lithography Colloidal assembly Conventional lithography Nanoimprint lithography Patterning Polymer resists
Keyword (fr)
Electrorésist Etat actuel Lithographie faisceau électron Lithographie nanoimpression Nanolithographie Photolithographie Photorésist Polymère
Keyword (en)
Electroresist State of the art Electron beam lithography Nanoimprint lithography Nanolithography Photolithography Photoresist Polymer
Keyword (es)
Polímero electrosensible Estado actual Litografía haz electrón Litografía nanoimpresión Fotolitografía Fotorresistencia Polímero
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A04 Machinery and processing / 001D10A04A Plastics / 001D10A04A8 Miscellaneous

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
24724355

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web