Broadband antireflection of silicon nanorod arrays prepared by plasma enhanced chemical vapor deposition
- Author
- DESHENG WANG1 ; ZHIBO YANG1 ; FEI LI1 ; DEQUAN LIU1 ; PENG WANG1 ; DEYAN HE1
[1] Department of Physics, Lanzhou University, Lanzhou 730000, China - Source
Applied surface science. 2011, Vol 258, Num 3, pp 1058-1061, 4 p ; ref : 21 ref
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Antireflection Electrodeposition Si nanorods VHF-PECVD
- Keyword (fr)
- Croissance film Dépôt électrolytique Méthode PECVD Nanobâtonnet Nanomatériau Réseau(arrangement) Silicium Si
- Keyword (en)
- Film growth Electrodeposition PECVD Nanorod Nanostructured materials Arrays Silicon
- Keyword (es)
- Nanopalito
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 24785905
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.apsusc.2011.08.129 
https://dx.doi.org/10.1016/j.apsusc.2011.08.129
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