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Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

Author
BIEDERMAN, H1 ; HLIDEK, P1 ; PESICKA, J1 ; SLAVINSKA, D1 ; STUNDZIA, V1 ; ZEMEK, J2 ; KINGDON, R. J3 ; HOWSON, R. P3
[1] Faculty of Mathematics and Physics, Charles University, Prague, Czech Republic
[2] Institute of Physics, Academy of Sciences, Prague, Czech Republic
[3] Department of Physics, LUT,, Loughborough, United Kingdom
Source

Vacuum. 1996, Vol 47, Num 12, pp 1453-1463 ; ref : 28 ref

CODEN
VACUAV
ISSN
0042-207X
Scientific domain
Metallurgy, welding; Physics
Publisher
Elsevier, Oxford
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Addition hydrogène Agrégat métallique Carbone Conductivité électrique Etude expérimentale Film Magnétron Matériau composite Morphologie Nickel Préparation chimique Pulvérisation cathodique Tension polarisation Transmission optique Vieillissement C:H Ni Métal transition Non métal
Keyword (en)
Hydrogen additions Metal cluster Carbon Electric conductivity Experimental study Films Magnetrons Composite materials Morphology Nickel Chemical preparation Cathode sputtering Bias voltage Optical transmission Aging Transition elements Nonmetals
Keyword (es)
Agregado metálico Voltage polarización Transmisión óptica
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
8115C Deposition by sputtering

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2514618

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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