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Effect of substrate bias in amorphous carbon films having embedded nanocrystallites

Author
ISHPAL1 ; PANWAR, O. S1 ; SRIVASTAVA, A. K1 ; KUMAR, Sushil1 ; TRIPATHI, R. K1 ; KUMAR, Mahesh1 ; SINGH, Sandeep1
[1] National Physical Laboratory, (C.S.I.R.), Dr. K. S. Krishnan Road, New Delhi-110 012, India
Source

Surface & coatings technology. 2011, Vol 206, Num 1, pp 155-164, 10 p ; ref : 59 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Amorphous carbon Filtered cathodic jet carbon arc Nanocrystallites Substrate bias
Keyword (fr)
Carbone Couche mince Etat amorphe Traitement surface
Keyword (en)
Carbon Thin films Amorphous state Surface treatments
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
25511840

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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