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MAPLE deposition of PEG:PLGA thin films

Author
PAUN, Irina Alexandra1 ; ION, Valentin2 ; MOLDOVAN, Antoniu2 ; DINESCU, Maria2
[1] Faculty of Applied Sciences, University Politehnica of Bucharest, 060042, Bucharest, Romania
[2] National Institute for Laser, Plasma and Radiation Physics, 077125, Magurele, Bucharest, Romania
Source

Applied physics. A, Materials science & processing (Print). 2012, Vol 106, Num 1, pp 197-205, 9 p ; ref : 46 ref

ISSN
0947-8396
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Angle contact Composition chimique Constante optique Couche mince Epaisseur Ethylène oxyde polymère Fluence Lactique acide polymère Microstructure Mouillabilité Mélange polymère Rugosité Spectrométrie FTIR Vitesse dépôt Dépôt par laser pulsé assisté par matrice
Keyword (en)
Contact angle Chemical composition Optical constant Thin film Thickness Ethylene oxide polymer Fluence Lactic acid polymer Microstructure Wettability Polymer blends Roughness Fourier-transformed infrared spectrometry Deposition rate Matrix assisted pulsed laser evaporation
Keyword (es)
Angulo contacto Composición química Constante óptica Capa fina Espesor Etileno óxido polímero Fluencia Láctico ácido polímero Microestructura Remojabilidad Rugosidad Espectrometría FTIR Velocidad deposición
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A08 Application fields

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
25579141

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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