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More than monitoring: Advanced lithographic process tuning

Author
CANTRELL, G. R1 ; DUMAYA, Jo Alvin1 ; BÜRGEL, Christian1 ; FEICKE, Axel1 ; HACKER, Martin1 ; UTZNY, Clemens1
[1] Advanced Mask Technology Center GmbH & Co. KG, Rahnitzer Allee 9, 01109 Dresden, Germany
Conference title
Photomask technology 2011 (19-22 September 2011, Monterey, California, United States)
Conference name
Photomask technology. Conference (Monterey CA 2011-09-19)
Author (monograph)
Maurer, Wilhelm (Editor); Abboud, Frank E (Editor)
SPIE, United States (Organiser of meeting)
Source

Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166 ; 81660M.1-81660M.15 ; 2 ; ref : 2 ref

CODEN
PSISDG
ISSN
0277-786X
ISBN
978-0-8194-8791-9
Scientific domain
Electronics; Optics; Physics
Publisher
SPIE, Bellingham Wash
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Analyse composante principale Fabrication microélectronique Interface utilisateur Lithographie Masque Monitorage Méthode statistique Photolithographie Résist amplification chimique Taille critique Technologie avancée
Keyword (en)
Principal component analysis Microelectronic fabrication User interface Lithography Mask Monitoring Statistical method Photolithography Chemically amplified resist Critical size Advanced technology
Keyword (es)
Análisis componente principal Fabricación microeléctrica Interfase usuario Litografía Máscara Monitoreo Método estadístico Fotolitografía Resistencia amplificación química Tecnología avanzada
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03J Hardware / 001D03J03 Input-output equipment

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
25602000

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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