The deposition of TiN thin films by nitrogen ion assisted deposition of Ti from a filtered cathodic arc source
- Author
- MARTIN, P. J1 ; BENDAVID, A2 ; KINDER, T. J1 ; WIELUNSKI, L1
[1] Division of Applied Physics, Commonwealth Scientfic and Indsutrial Research Organisation, Lindfield NSW 2070, Australia
[2] School of Physics, University of Technology, Sydney, 2007, Australia - Conference title
- International Conference on Metallurgical Coatings and Thin Films
- Conference name
- International Conference on Metallurgical Coatings and Thin Films (23 ; San Diego, CA 1996-04-22)
- Author (monograph)
- SARTWELL, Bruce D (Editor)1 ; MCGUIRE, Gary E (Editor)3 ; JEHN, Hermann A (Editor)2 ; PETROV, Ivan (Editor)4
American Vacuum Society ; Vacuum Metallurgy and Thin Films Divisions, New York, NY, United States (Funder/Sponsor)
[1] Naval Research Laboratory, Code 6170, 4555 Overlook Avenue, Washington, D.C. 20375, United States
[2] Forschungsinstitut für Edelmetalle und Metallcheme, Katharinenstrasse 17, 73525 Schwaebisch Gmünd, Germany
[3] Microelectronics Center of North Carolina, P.O. Box 12889, Research Triangle Park, NC 27709, United States
[4] University of Illinois, 1101 West Springfield Avenue, Urbana, IL 61801, United States - Source
Surface & coatings technology. 1996, Vol 86-87, Num 1-3, pp 271-278 ; 1 ; ref : 19 ref
- CODEN
- SCTEEJ
- ISSN
- 0257-8972
- Scientific domain
- General chemistry, physical chemistry; Metallurgy, welding
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Arc électrique Azote ion Cathode Composé binaire Couche mince Croissance cristalline en phase vapeur Effet physique rayonnement Etude expérimentale Ion Titane nitrure N Ti TiN Composé minéral Métal transition composé
- Keyword (en)
- Electric arcs Nitrogen ions Cathodes Binary compounds Thin films Crystal growth from vapors Physical radiation effects Experimental study Ions Titanium nitrides Inorganic compounds Transition element compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15J Ion and electron beam-assisted deposition; ion plating
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2572903
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0257-8972(96)02978-7 
https://dx.doi.org/10.1016/S0257-8972(96)02978-7
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