Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2575822

Fabrication of 5 nm resolution electrodes for molecular devices by means of electron beam lithography

Author
DI FABRIZIO, E1 ; GRELLA, L1 ; GENTILI, M1 ; BACIOCCHI, M1 ; MASTROGIACOMO, L1 ; MORALES, P2
[1] Istituto di Electronica dello Stato Solido-CNR Via Cineto Romano 42, 00156 Rome, Italy
[2] ENEA, Centro Ricerche della Casaccia, P.O. Box 2400, 00100 Rome, Italy
Source

Japanese journal of applied physics. 1997, Vol 36, Num 1AB, pp L70-L72 ; 2 ; ref : 8 ref

CODEN
JJAPA5
ISSN
0021-4922
Scientific domain
Crystallography; Optics; Condensed state physics; Physics; Plasma physics
Publisher
Japanese journal of applied physics, Tokyo
Publication country
Japan
Document type
Article
Language
English
Keyword (fr)
Adhérence Electronique moléculaire Etude expérimentale Fabrication Lithographie faisceau électron Méthacrylate de méthyle polymère Redresseur Resist Pointe électrode
Keyword (en)
Adhesion Molecular electronics Experimental study Manufacturing Electron beam lithography Methyl methacrylate polymer Rectifier Resist
Keyword (es)
Adherencia Electrónica molecular Estudio experimental Fabricación Litografía haz electrón Metacrilato de metilo polímero Rectificador Resistencia
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F18 Molecular electronics, nanoelectronics

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2575822

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web