Thin functional films by combustion chemical vapour deposition (C-CVD)
- Author
- STRUPPERT, Thomas1 ; HEFT, Andreas1 ; GRÜNLER, Bernd1
[1] INNOVENT e.V., Departement of Surface Engineering, Prüssingstr. 27B, 07745 Jena, Germany - Conference title
- 8th International Conference on Coatings on Glass and Plastics-ICCG8
- Conference name
- International Conference on Coatings on Glass and Plastics-ICCG8 (8 ; Braunschweig 2010-06-13)
- Author (monograph)
- SZYSZKA, B (Editor); KONDRUWEIT, S (Editor); PUETZ, J (Editor)
- Source
Thin solid films. 2012, Vol 520, Num 12, pp 4106-4109, 4 p ; ref : 16 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Atmospheric pressure Combustion CVD Oxides Surface functionalization
- Keyword (fr)
- Argent Article synthèse Couche mince Dépôt chimique phase vapeur Fonctionnalisation Oxyde de silicium Pression atmosphérique Verre flotté 6855J 8115G SiO2 Substrat verre WOx
- Keyword (en)
- Silver Reviews Thin films CVD Functionalization Silicon oxides Atmospheric pressure Float glass
- Keyword (es)
- Funciónalización Vidrio flotado
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 25864044
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2011.06.048 
https://dx.doi.org/10.1016/j.tsf.2011.06.048
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