Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile
- Author
- PEREIRA, Andre L. J1 2 ; GRACIA, Lourdes2 ; BELTRAN, Armando2 ; LISBOA-FILHO, Paulo N1 ; DA SILVA, Jose H. D1 ; ANDRES, Juan2
[1] Grupo de Materiais Avançados, Universidade Estadual Paulista Unesp/Bauru, São Paulo, Brazil
[2] Departament de Química Física i Analitica, Universitat Jaume I, Castello de la Plana, Spain - Source
Journal of physical chemistry. C. 2012, Vol 116, Num 15, pp 8753-8762, 10 p ; ref : 90 ref
- Publisher
- American Chemical Society, Columbus, OH
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Addition manganèse Aimantation Anatase Bande interdite Couche mince Densité état électron Diffraction RX Diffusion Raman Donnée expérimentale Effet électronique Etat électronique Etude théorique Ferromagnétique Microscopie électronique balayage Morphologie Méthode fonctionnelle densité Propriété optique Propriété électronique Pulvérisation irradiation Structure bande Structure électronique 6865 7321 7550T 7867 Substrat SiO2 Substrat TiO2
- Keyword (en)
- Manganese additions Magnetization Anatase Energy gap Thin films Electronic density of states XRD Raman scattering Experimental data Electronic effect Electron state Theoretical study Ferromagnetic materials Scanning electron microscopy Morphology Density functional method Optical properties Electronic properties Sputtering Band structure Electronic structure
- Keyword (es)
- Anatasa Difusión Ramán Efecto electrónico Estado electrónico Material ferromagnético Propiedad electrónica
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H65 Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C21 Electron states and collective excitations in thin films, multilayers, quantum wells, mesoscopic and nanoscale systems
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70E Magnetic properties and materials / 001B70E50 Studies of specific magnetic materials / 001B70E50T Small particles and nanoscale materials
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H67 Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures
- Discipline
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 25895517
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1021/jp210682d 
https://dx.doi.org/10.1021/jp210682d
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/jp210682d\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:9:\"\u0000*\u0000jtitle\";s:32:\"Journal of physical chemistry. C\";s:9:\"\u0000*\u0000stitle\";s:17:\"J. phys. chem., C\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:3:\"116\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"8753\";s:8:\"\u0000*\u0000epage\";s:4:\"8762\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1932-7447\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PEREIRA\";s:10:\"\u0000*\u0000aufirst\";s:10:\"Andre L. J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:15:\"GRACIA, Lourdes\";i:1;s:16:\"BELTRAN, Armando\";i:2;s:21:\"LISBOA-FILHO, Paulo N\";i:3;s:19:\"DA SILVA, Jose H. D\";i:4;s:12:\"ANDRES, Juan\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:8:\"\u0000*\u0000place\";s:12:\"Columbus, OH\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"10\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/jp210682d\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:9:\"\u0000*\u0000jtitle\";s:32:\"Journal of physical chemistry. C\";s:9:\"\u0000*\u0000stitle\";s:17:\"J. phys. chem., C\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:3:\"116\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"8753\";s:8:\"\u0000*\u0000epage\";s:4:\"8762\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1932-7447\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PEREIRA\";s:10:\"\u0000*\u0000aufirst\";s:10:\"Andre L. J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:15:\"GRACIA, Lourdes\";i:1;s:16:\"BELTRAN, Armando\";i:2;s:21:\"LISBOA-FILHO, Paulo N\";i:3;s:19:\"DA SILVA, Jose H. D\";i:4;s:12:\"ANDRES, Juan\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:8:\"\u0000*\u0000place\";s:12:\"Columbus, OH\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"10\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/jp210682d\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/jp210682d\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:9:\"\u0000*\u0000jtitle\";s:32:\"Journal of physical chemistry. C\";s:9:\"\u0000*\u0000stitle\";s:17:\"J. phys. chem., C\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:3:\"116\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"8753\";s:8:\"\u0000*\u0000epage\";s:4:\"8762\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1932-7447\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PEREIRA\";s:10:\"\u0000*\u0000aufirst\";s:10:\"Andre L. J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:15:\"GRACIA, Lourdes\";i:1;s:16:\"BELTRAN, Armando\";i:2;s:21:\"LISBOA-FILHO, Paulo N\";i:3;s:19:\"DA SILVA, Jose H. D\";i:4;s:12:\"ANDRES, Juan\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:8:\"\u0000*\u0000place\";s:12:\"Columbus, OH\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"10\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/jp210682d\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:9:\"\u0000*\u0000jtitle\";s:32:\"Journal of physical chemistry. C\";s:9:\"\u0000*\u0000stitle\";s:17:\"J. phys. chem., C\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:3:\"116\";s:8:\"\u0000*\u0000issue\";s:2:\"15\";s:8:\"\u0000*\u0000spage\";s:4:\"8753\";s:8:\"\u0000*\u0000epage\";s:4:\"8762\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"1932-7447\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:7:\"PEREIRA\";s:10:\"\u0000*\u0000aufirst\";s:10:\"Andre L. J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:15:\"GRACIA, Lourdes\";i:1;s:16:\"BELTRAN, Armando\";i:2;s:21:\"LISBOA-FILHO, Paulo N\";i:3;s:19:\"DA SILVA, Jose H. D\";i:4;s:12:\"ANDRES, Juan\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:110:\"Structural and Electronic Effects of Incorporating Mn in Ti02 Films Grown by Sputtering: Anatase versus Rutile\";s:8:\"\u0000*\u0000place\";s:12:\"Columbus, OH\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"10\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
