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Electronic properties of dislocations introduced mechanically at room temperature on a single crystal silicon surface

Author
OGAWA, Masatoshi1 ; KAMIYA, Shoji1 ; IZUMI, Hayato1 ; TOKUDA, Yutaka2
[1] Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan
[2] Aichi Institute of Technology, Yachikusa, Yakusa-cho, Toyota, Aichi 470-0392, Japan
Conference title
Proceedings of the 26th International Conference on Defects in Semiconductors 26th ICDS
Conference name
International Conference on Defects in Semiconductors (ICDS-26) (ICDS-26) (26 ; Nelson 2011-07-18)
Author (monograph)
EVANS-FREEMAN, Jan (Editor)1 ; VERNON-PARRY, Karen (Editor)2 ; ALLEN, Martin (Editor)1
[1] University of Canterbury, Christchurch, New Zealand
[2] Sheffield Hallam University, Sheffield, United Kingdom
Source

Physica. B, Condensed matter. 2012, Vol 407, Num 15, pp 3034-3037, 4 p ; ref : 12 ref

ISSN
0921-4526
Scientific domain
Crystallography; Condensed state physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Conference Paper
Language
English
Author keyword
Adsorption DLTS Desorption Dislocation Si Trap level
Keyword (fr)
Adsorption Atmosphère contrôlée DLTS Dislocation Désorption Effet température Etat défaut Monocristal Piégeage porteur charge Silicium Traitement thermique Si
Keyword (en)
Adsorption Controlled atmospheres DLTS Dislocations Desorption Temperature effects Defect states Monocrystals Charge carrier trapping Silicon Heat treatments
Keyword (es)
Captura portador carga
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70A Electron states / 001B70A55 Impurity and defect levels / 001B70A55C Elemental semiconductors

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
26093354

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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