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Molecular layer epitaxy by real-time optical process monitoring

Author
BACHMANN, K. J1 ; HÖPFNER, C1 ; BANKS, H. T3 ; ROSSOW, U4 ; SUKIDI, N1 ; MILLER, A. E1 ; HARRIS, C1 ; ASPNES, D. E2 ; DIETZ, N. A2 ; TRAN, H. T3 ; BEELER, S3 ; ITO, K3
[1] Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7919, United States
[2] Department of Physics, North Carolina State University, Raleigh, NC 27695-7919, United States
[3] Department of Mathematics, North Carolina State University, Raleigh, NC 27695-7919, United States
[4] Fachbereich Physik, Technische Universität Berlin, Berlin, Germany
Conference title
Atomic layer epitaxy and related surfaces processes
Conference name
ALE-4. International Symposium (4 ; Linz 1996-07-29)
Author (monograph)
SITTER, H (Editor)1 ; HEINRICH, H (Editor)1
[1] Johannes Kepler University, Linz, Austria
Source

Applied surface science. 1997, Vol 112, pp 38-47 ; ref : 26 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Keyword (fr)
Condensation faisceau chimique Etude expérimentale Gallium phosphure Matériau semiconducteur Mécanisme croissance Méthode couche atomique Méthode optique Spectre réflexion Ga P GaP Substrat Si Composé minéral
Keyword (en)
Chemical beam condensation Experimental study Gallium phosphides Semiconductor materials Growth mechanism Atomic layer method Optical method Reflection spectrum Inorganic compounds
Keyword (es)
Condensación haz químico Mecanismo crecimiento Método capa atómica Método óptico Espectro reflexión
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Pacs
8115H Molecular, atomic, ion, and chemical beam epitaxy

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2632501

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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