Influence of thin platinum layer on the magnetic properties of multiple layers of CVD cobalt thin films
- Author
- DEO, Nirmalendu1 ; BAIN, Michael F1 ; MONTGOMERY, John H1 ; GAMBLE, Harold S1
[1] Northern Ireland Semiconductor Research Centre. School of Electrical and Electronic Engineering and Computer Science, The Queen's University of Belfast, Belfast BT7 INN, United Kingdom - Source
Journal of materials science. Materials in electronics. 2012, Vol 23, Num 10, pp 1881-1886, 6 p ; ref : 29 ref
- ISSN
- 0957-4522
- Scientific domain
- Electronics; Condensed state physics
- Publisher
- Springer, Norwell, MA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Aimant permanent Aimantation Champ coercitif Cobalt Couche barrière Couche mince Cycle hystérésis Dépôt chimique phase vapeur Epaisseur couche Evaporation faisceau électronique Fabrication microélectronique Force coercitive Matériau magnétique doux Microscopie force atomique Microscopie force magnétique Microscopie électronique balayage Microstructure Multicouche Méthode MOCVD Platine Propriété magnétique Recuit Rugosité Silicium Structure domaine Structure lamellaire Système vide Traitement matériau 0779 6865 7550W 7575 8115G 8540H
- Keyword (en)
- Permanent magnet Magnetization Coercive force Cobalt Barrier layer Thin film Hysteresis loop Chemical vapor deposition Layer thickness Electron beam evaporation Microelectronic fabrication Coercive force Soft magnetic materials Atomic force microscopy Magnetic force microscopy Scanning electron microscopy Microstructure Multiple layer MOCVD Platinum Magnetic properties Annealing Roughness Silicon Domain structure Lamellar structure Vacuum systems Material processing
- Keyword (es)
- Imán permanente Imanación Campo coercitivo Cobalto Capa fina Ciclo histéresis Depósito químico fase vapor Espesor capa Fabricación microeléctrica Microscopía fuerza atómica Microscopía fuerza magnética Microscopía electrónica barrido Microestructura Capa múltiple Platino Propiedad magnética Recocido Rugosidad Silicio Estructura dominio Estructura lamelar Tratamiento material
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70E Magnetic properties and materials / 001B70E50 Studies of specific magnetic materials / 001B70E50W Permanent magnets
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03C Materials
- Discipline
- Electronics Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 26408212
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s10854-012-0678-9 
https://dx.doi.org/10.1007/s10854-012-0678-9
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