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The influence of organic substituents of polyhedral oligomeric silsesquioxane on the properties of epoxy-based hybrid nanomaterials

Author
CONSTANTIN, F1 ; GAREA, S. A1 ; IOVU, H1
[1] University POLITEHNICA of Bucharest, Advanced Polymer Materials Group, Calea Victoriei 149, 010072 Bucharest, Romania
Source

Composites. Part B, Engineering. 2013, Vol 44, Num 1, pp 558-564, 7 p ; ref : 28 ref

ISSN
1359-8368
Scientific domain
Chemical industry parachemical industry; Mechanics acoustics; Metallurgy, welding; Polymers, paint and wood industries
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
D. Electron microscopy D. Thermal analysis E. Thermosetting resins Polyhedral oligomeric silsesquioxane (POSS)
Keyword (fr)
Epoxyde résine Matériau hybride Molécule polyédrique Oligomère Polymère Propriété thermique Silsesquioxane polymère Température transition vitreuse Thermodurcissable
Keyword (en)
Epoxy resin Hybrid material Polyhedral molecule Oligomer Polymer Thermal properties Silsesquioxane polymer Glass transition temperature Thermosetting resin
Keyword (es)
Epóxido resina Material híbrido Molécula poliédrica Oligómero Polímero Propiedad térmica Silsesquioxano polímero Temperatura transición vítrosa Termoestable
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A06 Forms of application and semi-finished materials / 001D10A06H Composites

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A06 Forms of application and semi-finished materials / 001D10A06I Laminates

Discipline
Physical chemistry of polymers Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
26700766

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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