The potential dependence of Co―Cu alloy thin films electrodeposited on n-Si(100) substrate
- Author
- KHELLADI, M. R1 ; MENTAR, L1 ; AZIZI, A1 ; MAKHLOUFI, L2 ; SCHMERBER, G3 ; DINIA, A3
[1] Laboratoire de Chimie, Ingenierie Moléculaire et Nanostructures, Universite F. Abbas-Sétif, 19000 Sétif, Algeria
[2] Laboratoire de Technologie Des Materiaux et Genie Des Procédés, Universite de Bejaia, Bejaia, Algeria
[3] Institut de Physique et Chimie Des Matériaux de Strasbourg (IPCMS), UMR 7504 CNRS, Universite de Strasbourg, 23 Rue Du Loess, BP 43, 67034 Strasbourg, France - Source
Journal of materials science. Materials in electronics. 2012, Vol 23, Num 12, pp 2245-2250, 6 p ; ref : 18 ref
- ISSN
- 0957-4522
- Scientific domain
- Electronics; Condensed state physics
- Publisher
- Springer, Norwell, MA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Aimantation Cobalt alliage Conception compacte Couche mince Cuivre Diffractométrie RX Dissolution Dépôt électrolytique Fabrication microélectronique Granulométrie Grosseur grain Microscopie électronique balayage Microstructure Morphologie Paramètre cristallin Réseau cubique face centrée Semiconducteur type n Silicium Spectrométrie absorption atomique Structure dendritique Voltammétrie 0779 6865 8540H
- Keyword (en)
- Magnetization Cobalt alloy Compact design Thin film Copper X ray diffractometry Dissolution Electrodeposition Microelectronic fabrication Grain size analysis Grain size Scanning electron microscopy Microstructure Morphology Lattice parameters FCC lattices n type semiconductor Silicon Atomic absorption spectrometry Dendritic structure Voltammetry
- Keyword (es)
- Imanación Cobalto aleación Concepción compacta Capa fina Cobre Difractometría RX Disolución Depósito electrolítico Fabricación microeléctrica Granulometría Grosor grano Microscopía electrónica barrido Microestructura Morfología Parámetro cristalino Semiconductor tipo n Silicio Espectrometría absorción atómica Estructura dendrítica Voltametría
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70E Magnetic properties and materials / 001B70E60 Domain effects, magnetization curves, and hysteresis / 001B70E60E Magnetization curves, magnetization reversal, hysteresis, barkhausen and related effects
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03C Materials
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 26742615
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1007/s10854-012-0784-8 
https://dx.doi.org/10.1007/s10854-012-0784-8
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:25:\"10.1007\/s10854-012-0784-8\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:9:\"\u0000*\u0000jtitle\";s:54:\"Journal of materials science. Materials in electronics\";s:9:\"\u0000*\u0000stitle\";s:31:\"J. mater. sci., Mater. electron\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:2:\"23\";s:8:\"\u0000*\u0000issue\";s:2:\"12\";s:8:\"\u0000*\u0000spage\";s:4:\"2245\";s:8:\"\u0000*\u0000epage\";s:4:\"2250\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0957-4522\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"KHELLADI\";s:10:\"\u0000*\u0000aufirst\";s:4:\"M. R\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:9:\"MENTAR, L\";i:1;s:8:\"AZIZI, A\";i:2;s:12:\"MAKHLOUFI, L\";i:3;s:12:\"SCHMERBER, G\";i:4;s:8:\"DINIA, A\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:8:\"\u0000*\u0000place\";s:11:\"Norwell, MA\";s:6:\"\u0000*\u0000pub\";s:8:\"Springer\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:25:\"10.1007\/s10854-012-0784-8\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:9:\"\u0000*\u0000jtitle\";s:54:\"Journal of materials science. Materials in electronics\";s:9:\"\u0000*\u0000stitle\";s:31:\"J. mater. sci., Mater. electron\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:2:\"23\";s:8:\"\u0000*\u0000issue\";s:2:\"12\";s:8:\"\u0000*\u0000spage\";s:4:\"2245\";s:8:\"\u0000*\u0000epage\";s:4:\"2250\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0957-4522\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"KHELLADI\";s:10:\"\u0000*\u0000aufirst\";s:4:\"M. R\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:9:\"MENTAR, L\";i:1;s:8:\"AZIZI, A\";i:2;s:12:\"MAKHLOUFI, L\";i:3;s:12:\"SCHMERBER, G\";i:4;s:8:\"DINIA, A\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:8:\"\u0000*\u0000place\";s:11:\"Norwell, MA\";s:6:\"\u0000*\u0000pub\";s:8:\"Springer\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:25:\"10.1007\/s10854-012-0784-8\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:25:\"10.1007\/s10854-012-0784-8\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:9:\"\u0000*\u0000jtitle\";s:54:\"Journal of materials science. Materials in electronics\";s:9:\"\u0000*\u0000stitle\";s:31:\"J. mater. sci., Mater. electron\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:2:\"23\";s:8:\"\u0000*\u0000issue\";s:2:\"12\";s:8:\"\u0000*\u0000spage\";s:4:\"2245\";s:8:\"\u0000*\u0000epage\";s:4:\"2250\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0957-4522\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"KHELLADI\";s:10:\"\u0000*\u0000aufirst\";s:4:\"M. R\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:9:\"MENTAR, L\";i:1;s:8:\"AZIZI, A\";i:2;s:12:\"MAKHLOUFI, L\";i:3;s:12:\"SCHMERBER, G\";i:4;s:8:\"DINIA, A\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:8:\"\u0000*\u0000place\";s:11:\"Norwell, MA\";s:6:\"\u0000*\u0000pub\";s:8:\"Springer\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:25:\"10.1007\/s10854-012-0784-8\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:9:\"\u0000*\u0000jtitle\";s:54:\"Journal of materials science. Materials in electronics\";s:9:\"\u0000*\u0000stitle\";s:31:\"J. mater. sci., Mater. electron\";s:7:\"\u0000*\u0000date\";s:4:\"2012\";s:9:\"\u0000*\u0000volume\";s:2:\"23\";s:8:\"\u0000*\u0000issue\";s:2:\"12\";s:8:\"\u0000*\u0000spage\";s:4:\"2245\";s:8:\"\u0000*\u0000epage\";s:4:\"2250\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0957-4522\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"KHELLADI\";s:10:\"\u0000*\u0000aufirst\";s:4:\"M. R\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:5:{i:0;s:9:\"MENTAR, L\";i:1;s:8:\"AZIZI, A\";i:2;s:12:\"MAKHLOUFI, L\";i:3;s:12:\"SCHMERBER, G\";i:4;s:8:\"DINIA, A\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:92:\"The potential dependence of Co\u2015Cu alloy thin films electrodeposited on n-Si(100) substrate\";s:8:\"\u0000*\u0000place\";s:11:\"Norwell, MA\";s:6:\"\u0000*\u0000pub\";s:8:\"Springer\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:1:\"6\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
