The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc
- Author
- JIANG, Nanke1 ; GEORGIEV, Daniel G1 ; JAYATISSA, Ahalapitiya H2
[1] Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH 43606, United States
[2] Department of Mechanical, Industrial, and Manufacturing Engineering, University of Toledo, Toledo, OH 43606, United States - Source
Semiconductor science and technology. 2013, Vol 28, Num 2 ; 025009.1-025009.8 ; ref : 28 ref
- CODEN
- SSTEET
- ISSN
- 0268-1242
- Scientific domain
- Electronics; Optics; Condensed state physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Absorption optique Couche mince Diffraction RX Dépôt physique phase vapeur Dépôt pulvérisation Effet pression Limite absorption Microstructure Mélange gaz Nanomatériau Nitrure de zinc Non stoechiométrie Oxyde de zinc Phase cristalline Propriété optique Propriété électrique Pulvérisation cathodique Pulvérisation haute fréquence Pulvérisation irradiation Pulvérisation réactive Recuit Spectre absorption Zinc 6855J 7350 7866 8115C
- Keyword (en)
- Optical absorption Thin films XRD Physical vapor deposition Sputter deposition Pressure effects Absorption edge Microstructure Gas mixtures Nanostructured materials Zinc nitride Nonstoichiometry Zinc oxide Crystalline phase Optical properties Electrical properties Cathode sputtering Radiofrequency sputtering Sputtering Reactive sputtering Annealing Absorption spectra Zinc
- Keyword (es)
- Absorción óptica Zinc nitruro Zinc óxido Fase cristalina Pulverización alta frecuencia
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C50 Electronic transport phenomena in thin films and low-dimensional structures
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 26875803
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0268-1242/28/2/025009 
https://dx.doi.org/10.1088/0268-1242/28/2/025009
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