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Crystalline perfection of Hg1-xCdxTe epilayers by the vertical dipping liquid-phase epitaxy

Author
ZHU, J1 2 3 ; CHU, J1 ; LI, B1 ; CHEN, X1 ; CAO, J1 ; CHENG, J2
[1] National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
[2] Department of Inorganic Materials, East China University of Science and Technology, Shanghai 200237, China
[3] Test Center, Shanghai Institute of Building Materials, Shanghai 200433, China
Source

Journal of crystal growth. 1997, Vol 177, Num 1-2, pp 61-66 ; ref : 28 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Cadmium tellurure Composé ternaire Croissance cristalline Densité dislocation Epitaxie phase liquide Etude expérimentale Hétérojonction Matériau semiconducteur Mercure tellurure Perfection cristalline XRD Cd Hg Te Hg1-xCdxTe Composé minéral
Keyword (en)
Cadmium tellurides Ternary compounds Crystal growth Dislocation density LPE Experimental study Heterojunctions Semiconductor materials Mercury tellurides Crystal perfection XRD Inorganic compounds
Keyword (es)
Densidad dislocación Perfección cristalina
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15L Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)

Pacs
8115L Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2708687

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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